Schott Ag

Koninklijke Philips Corporation N.v.

Schott Glas

Philips Intellectual Property & Standards Gmbh

Wolfram Maring

Lars Bewig

Jochen Heinz

Stefan Hauttmann

Thomas Küpper

Marten Walther

Stephan Behle

Lutz Klippe

Stefan Bauer

Christoph Moelle

Thomas Kuepper

Markus Kuhr

Wolfgang Moehl

Detlef Wolff

Frank Koppe

Christopher Moelle

Christoph Mölle

Steffen Holzapfel

Thomas K&uuml;pper

Jochen; Heinz

It is described an emitter () for X-ray tubes comprising: a flat foil with an emitting section (); and at least two electrically conductive fixing sections (--); wherein the emitting section () is unstructured.

Emitter for X-ray tubes and heating method therefore

It is described an electron optical arrangement, a X-ray emitting device and a method of creating an electron beam. An electron optical apparatus () comprises the following components along an optical axis (): a cathode with an emitter () having a substantially planar surface () for emitting electrons; an anode () for accelerating the emitted electrons in a direction essentially along the optical axis (); a first magnetic quadrupole lens () for deflecting the accelerated electrons and having a first yoke (); a second magnetic quadrupole lens () for further deflecting the accelerated electrons and having a second yoke (); and a magnetic dipole lens () for further deflecting the accelerated electrons.

Electron optical apparatus, X-ray emitting device and method of producing an electron beam

An apparatus for coating objects having a single microwave source, two or more coating chambers, and an impedance structure or a waveguide structure. The coating chambers are connected to the single microwave source. The impedance structure or waveguide structure divides the microwave energy in order to generate plasmas in the coating chambers.

Device for the coating of objects

In order to improve the energy balance of an HID lamp, the quartz burner, preferably the inside thereof, is coated with a UV reflecting layer system by alternatingly applying amorphous thin layers made at least of titanium oxide and silicon oxide having the respective general stoichiometry TiOand SiOby means of a plasma impulse chemical vapor deposition (PICVD) method at a high power density and increased substrate temperatures ranging from 100&#xb0; to 400&#xb0; C., using small growth rates ranging from 1 nm/sec to 100 nm/sec so as to form an interference layer system having a thickness of less than 1200 nm and a minimized UV-active defective spot rate ranging from 0.1 to 1 percent.

Method for coating the quartz burner of an HID lamp

The invention relates to a process for producing an object which has optical layers. According to the invention such a process comprises the following process steps: To a substrate of plastic material several optical layers are applied; the optical layers are applied by means of a chemical plasma-impulse vaporization (PICVC).

Object which has optical layers

A process for producing an object which has optical layers comprising the steps of applying optical layers to a substrate of plastic material wherein the optical layers are applied by means of a chemical plasma-impulse vaporization process (PICVD).

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Hamburg, Germany

Wolfram Maring