Singulus Technologies Ag

Wolfram Maass

Berthold Ocker

Jürgen Langer

Eric Claussen

Christoph Mundorf

Helmut Lausmann

Rudi Spielvogel

Uwe Mühlfeld

Wolfgang Stern

Dietmer Schneider

Matthias Landmann

Reinhard Sommerfeld

Roland Schneider

Helmut John

A system and method for treating a substrate in a reaction chamber. A transfer chamber is arranged between a first lock and a second lock, wherein the second lock is provided between the transfer chamber and the reaction chamber. A substrate is transferred into the transfer chamber through the first lock, and the first lock is closed. In a next step, the transfer chamber is flooded with the same gas as in the reaction chamber and the pressure and temperature of the gaseous atmosphere in the transfer chamber is controlled to be the same as in the reaction chamber. Then, the second lock is opened and the substrate is transferred from the transfer chamber into the reaction chamber to treat the substrate. A computer program product for carrying out the above method.

Method and system for naturally oxidizing a substrate

The invention relates to a target for coating a substrate with an alloy by means of cathode sputtering, said alloy having at least one first material and one second material as alloy components. The surface of the target has at least one first section made of the first material and one second section made of the second material. The two sections adjoin each other and form a common boundary line. The invention further relates to a device and a method for coating a substrate with an alloy by means of cathode sputtering using the target according to the invention.

Coating substrates with an alloy by means of cathode sputtering

The invention relates to a sputtering cathode () for coating a substrate (), which comprises a device () for generating an external magnetic field with substantially parallel magnetic field lines () substantially in the plane of the substrate. The invention further relates to a device and a method for coating a substrate with several layers, whereby several sputtering cathodes are disposed in a circle with their target effective areas pointing radially outward.

Sputtering cathode and device and method for coating a substrate with several layers

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Linsengericht-Grossenhausen, Germany

Wolfram Maass