Leybold Aktiengesellschaft

Balzers Prozeb-systeme Gmbh

Wolfram Maass

Michael Scherer

Joachim Szczyrbowski

Peter Mahler

Ulrich Patz

In an apparatus for coating substrates (9), especially with magnetizable materials such as NiFe, with a circular, disk-shaped, rotatably supported substrate holder (3), which is subjected to an HF bias voltage, which is provided around its circumference and on the back with dark-space shield (1), and which rotates under at least one opposing cathode (7), and with a device for generating a magnetic field (13) parallel to the plane of the substrate (9), the magnetic field is generated by an electromagnet, the exciter coil of which, together with the lower part of the yoke (10), is housed in the dark-space shield (1), whereas the extended pole pieces (12, 12'), which are electrically insulated from the coil yoke (10) via the dark space gap (2), are housed in the substrate holder (3) in proximity to the substrate (9).

Apparatus for coating substrates especially with magnetizable materials

An AC voltage source connected to at least one cathode is switched off rapidly upon the occurrence of a critical number of so-called 'microarcs' which precede a 'large arc'. In order to be able to differentiate between large arcs and microarcs, a special counting and evaluation device is provided.

Device for suppressing flashovers in cathode sputtering installations

A pair of magnetron cathodes in an evacuable coating chamber are connected to the outputs of the secondary winding of a transformer, the primary winding being connected to the outputs of a medium frequency A.C. generator. An oval target is mounted on each cathode and surrounded by stainless steel bars. As an alternative the bars may be configured as plates connected to ground and mounted to the target by insulating spacers.

Apparatus for coating a substrate by magnetron sputtering

In a magnetron sputtering cathode for vacuum coating apparatus with a circular target plate and a plurality of magnet arrangements arranged behind the target plate and with a drive means for the continuous rotation of at least one of the magnet arrangements (12, 12') about the central axis A of the target plate, there is provided, in the radially outer marginal area of the target plate, a first magnet arrangement (15, 15', . . .) for the production of a magnetic tunnel section substantially concentric with the axis of rotation A, and between the axis of rotation A and the first magnet arrangement (15, 15', . . .) and, between the axis of rotation A and the first magnet arrangement (15, 15', . . .), a second magnet arrangement (12, 12') offset radially inwardly, and a third magnet arrangement (11, 11', . . .) which cooperate with the first magnet arrangement (15, 15', . . .) for the production of the magnetic tunnel section which extends substantially over one sector of the target plate, the second magnet system being formed from a group of individual magnets (12, 12') such that, upon a rotation of the second magnet arrangement (12, 12') about the axis of rotation (A) or of a fourth magnet arrangement (13) the surface elements of the target plate are eroded more strongly at the margin, so that a substrate field mounted opposite the target plate becomes uniformly coated.

Magnetron sputtering cathode for vacuum coating apparatus

A stationary magnetron sputtering cathode for vacuum coating systems for substrates 17 passing in front of the cathode 10 on a circular path K and disposed on a substrate holder 4 has a circular disk-like yoke plate 15, and a first group or row of magnets 14b, 14b'. . . , essentially forming a closed circular ring, is provided in the marginal zone of the yoke plate 15 and a second group or row of magnets 14a, 14a'. . . , forming a random but essentially symmetric configuration, is provided in the center of the yoke plate 15. The segment of the magnetic tunnel located in the half (III+IV) of the yoke plate 15 which faces away from the rotating shaft 5 of the substrate holder 4 has a greater total length than the tunnel segment provided on the half (I+II) of yoke plate 15 facing toward the rotating shaft 5.

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Erlensee, Germany

Wolfram Maass