Carl Zeiss Microscopy Gmbh

Other

Wolfram Buehler

Emmerich Bertagnolli

Heinz Wanzenboeck

Holger Doemer

Daniel Fischer

Carl Kuebler

Gottfried Hochleitner

Volker Drexel

Ulrike Zeile

Camille Stebler

Alexander Rosenthal

Matthias Lang

Joerg Stodolka

Peter Roediger

A process of preparing a lamella from a substrate includes manufacturing a protection strip on an edge portion of the lamella to be prepared from the substrate, and preparing the lamella, wherein the manufacturing the protection strip includes a first phase of activating a surface area portion of the substrate, and a second phase of electron beam assisted deposition of the protective strip on the activated surface area portion from the gas phase.

Method of depositing protective structures

A processing system for processing an object () is provided, wherein the processing system is adapted, to focus a first energy beam, in particular an electron beam (), and a second energy beam, in particular an ion beam (), on a focusing region () in which a object () to be processed is arrangeable. A processing chamber wall () having two openings () for traversal of both energy beams and a connector () for supplying process gas delimits a processing chamber () from a vacuum chamber () of the processing system. Processing the object by activating the process gas through one of the energy beams and inspecting the object via one of the energy beams is enabled for different orientations of the object relative to a propagation direction of one of the energy beams.

Processing system

An electron beam source includes a base and a tip fixed to the base and extending from the base. The tip includes a core and a coating applied to the core. The core has a surface that includes a first material. The coating includes a second material which is different from the first material. The second material forms a surface of the tip, and the second coating includes more than 30% by weight of a lanthanide element.

Electron beam source and method of manufacturing the same

A particle beam systemfor cleaning itself comprises an irradiation system to direct electromagnetic radiation onto the surfaces to be cleaned and a supply systemto supply a precursor gas to the interior of the vacuum chamberof the particle beam system. The precursor gas is activated in a vicinity of the surfaces to be cleaned and is converted into a reaction gas which reacts with the contaminants present on the irradiated surfaces such that said contaminants may be pumped out then.

Particle beam microscopy system and method for operating the same

Growing community of inventors

Hermaringen, Germany

Wolfram Buehler