Leybold Aktiengesellschaft

Heraeus Quarzglas Gmbh & Co Kg

Wolfgang Stang

Martin Trommer

Waltraud Werdecker

Michael Scherer

Roland Gesche

Jörg Becker

Peter Mahler

Jürgen Weber

Juergen Weber

Ulrich Kirst

In a coating apparatus, a sputter cathode (1) has, directly side by side, two electrodes (2, 3) connected in common to a high-frequency generator and having each a target (9, 10). The targets (9, 10) of both electrodes (2, 3) abut one another each with a straight edge (11, 12). A dark space shield surrounds both electrodes (2, 3) and targets (9, 10) together.

Dual cathode sputter coating apparatus

A vacuum chamber houses a rotatable substrate holder next to a door having a cathode target mounted therein. A plate-like mask is movable to a position between the substrate holder and the door so that the target can be cleaned without contaminating the substrate. The mask is preferably moved by a screw jack including a tube driven through a sealed hole in the chamber wall.

Apparatus for treating substrates in a vacuum chamber

Apparatus for the coating and etching of substrates in a vacuum chamber (4), includes a cathode (17, 17') having a target (18, 18'), and a rotatable structure (8) shaped as an essentially cylindrical hollow body having circular disk-shaped end faces provided with pivot shafts (10, 10') held for rotation about a horizontal axis (r) in bearings (11, 11') disposed on the side walls (12, 12') of the vacuum chamber (4). Mountings (19, 19') for holding the substrates in place are provided on the circumference of the hollow body, the cathode (17, 17') and the etching anode (16) being disposed opposite the rotatable structure (8) in a plane (E) running horizontally and approximately in the plane of the axis of rotation (r).

Apparatus for coating and/or etching substrates in a vacuum chamber

Growing community of inventors

Kefenrod, Germany

Wolfgang Stang