Abb Technology Ag

Abb Schweiz Ag

Wolfgang Janisch

Munaf Rahimo

Arnost Kopta

Jan Vobecky

Eustachio Faggiano

Sven Matthias

Atze De Vries

Frank Ritchie

A method for manufacturing a vertical power semiconductor device is provided, wherein a first impurity is provided at the first main side of a semiconductor wafer. A first oxide layer is formed on the first main side of the wafer, wherein the first oxide layer is partially doped with a second impurity in such way that any first portion of the first oxide layer which is doped with the second impurity is spaced away from the semiconductor wafer by a second portion of the first oxide layer which is not doped with the second impurity and which is disposed between the first portion of the first oxide layer and the first main side of the semiconductor wafer. Thereafter a carrier wafer is bonded to the first oxide layer. During front-end-of-line processing on the second main side of the semiconductor wafer, the second impurity is diffused from the first oxide layer into the semiconductor wafer from its first main side by heat generated during the front-end-of-line processing.

Method for manufacturing a semiconductor device comprising a thin semiconductor wafer

A reverse-conducting semiconductor device (RC-IGBT) including a freewheeling diode and an insulated gate bipolar transistor (IGBT), and a method for making the RC-IGBT are provided. A first layer of a first conductivity type is created on a collector side before a second layer of a second conductivity type is created on the collector side. An electrical contact in direct electrical contact with the first and second layers is created on the collector side. A shadow mask is applied on the collector side, and a third layer of the first conductivity type is created through the shadow mask. At least one electrically conductive island, which is part of a second electrical contact in the finalized RC-IGBT, is created through the shadow mask. The island is used as a mask for creating the second layer, and those parts of the third layer which are covered by the island form the second layer.

Reverse-conducting semiconductor device

A maximum-punch-through semiconductor device such as an insulated gate bipolar transistor (IGBT) or a diode, and a method for producing same are disclosed. The MPT semiconductor device can include at least a two-layer structure having an emitter metallization, a channel region, a base layer with a predetermined doping concentration N, a buffer layer and a collector metallization. A thickness W of the base layer can be determined by: wherein a punch-through voltage Vof the semiconductor device is between 70% and 99% of a break down voltage Vof the semiconductor device, and wherein the thickness W is a minimum thickness of the base layer between a junction to the channel region and the buffer layer.

Punch-through semiconductor device and method for producing same

A controlled-punch-through semiconductor device with a four-layer structure is disclosed which includes layers of different conductivity types, a collector on a collector side, and an emitter on an emitter side which lies opposite the collector side. The semiconductor device can be produced by a method performed in the following order: producing layers on the emitter side of wafer of a first conductivity type; thinning the wafer on a second side; applying particles of the first conductivity type to the wafer on the collector side for forming a first buffer layer having a first peak doping concentration in a first depth, which is higher than doping of the wafer; applying particles of a second conductivity type to the wafer on the second side for forming a collector layer on the collector side; and forming a collector metallization on the second side. At any stage particles of the first conductivity type can be applied to the wafer on the second side for forming a second buffer layer with a second peak doping concentration lower than the first peak doping concentration of the first buffer layer, but higher than the doping of the wafer. A third buffer layer can be arranged between the first depth and the second depth with a doping concentration which is lower than the second peak doping concentration of the second buffer layer. Thermal treatment can be used for forming the first buffer layer, the second buffer layer and/or the collector layer.

Growing community of inventors

Unterkulm, Switzerland

Wolfgang Janisch