Carl-zeiss-stiftung

Carl Zeiss Smt Gmbh

Carl-zeiss-smt Ag

Carl Zelss Smt Ag

Wolfgang Hummel

Hubert Holderer

Jochen Weber

Christian Wagner

Stefan Xalter

Jochen Becker

Rudolf Von B&uuml;nau

Ulrich Weber

Sascha Bleidistel

Alexander Kohl

Johannes Lippert

Juergen Fischer

Olaf Conradi

Thorsten Rassel

Karl-Eugen Aubele

Erich Merz

Klaus Rief

Markus Neumaier

Raoul Reiner

Michael Muehlbeyer

Stefan Schoengart

Toralf Gruner

Heiko Feldmann

Gerald Richter

Andreas Frommeyer

Baerbel Schwaer

Werner M&uuml;ller-Rissmann

Baerbel Trossbach

Karl-Heinz Schuster

Markus Hauf

Boris Bittner

Arif Kazi

Payam Tayebati

Johannes Rau

Stephan Back

Michael Mühlbeyer

Bärbel Trossbach

Stefan Schöngart

Jürgen Fischer

Reiner Raoul

The invention relates to a method for improving the imaging properties of a micro lithography projection objective, wherein the projection objective has a plurality of lenses between an object plane and an image plane, a first lens of the plurality of lenses being assigned a first manipulator for actively deforming the lens, the first lens being deformed for at least partially correcting an aberration, at least one second lens of the plurality of lenses furthermore being assigned at least one second manipulator, and the second lens being deformed in addition to the first lens. Furthermore, a method is described for selecting at least one lens of a plurality of lenses of a projection objective as actively deformable element, and a projection objective.

Method for improving the imaging properties of a projection objective, and such a projection objective

The invention relates to a method for improving the imaging properties of a micro lithography projection objective, wherein the projection objective has a plurality of lenses between an object plane and an image plane, a first lens of the plurality of lenses being assigned a first manipulator (ml, Mn) for actively deforming the lens, the first lens being deformed for at least partially correcting an aberration, at least one second lens of the plurality of lenses furthermore being assigned at least one second manipulator, and the second lens being deformed in addition to the first lens. Furthermore, a method is described for selecting at least one lens of a plurality of lenses of a projection objective as actively deformable element, and a projection objective.

An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.

Imaging device in a projection exposure facility

A projection objective of a microlithographic projection exposure apparatus comprises a manipulator for reducing rotationally asymmetric image errors. The manipulator in turn contains a lens, an optical element and an interspace formed between the lens and the optical element, which can be filled with a liquid. At least one actuator acting exclusively on the lens is furthermore provided, which can generate a rotationally asymmetric deformation of the lens.

Projection objective of a microlithographic projection exposure apparatus

The invention relates to a method -for improving the imaging properties of a micro lithography projection objective (), wherein the projection objective has a plurality of lenses (L, L, L, L, L, L, L, L) between an object plane and an image plane, a first lens of the plurality of lenses being assigned a first manipulator (ml, Mn) for actively deforming the lens, the first lens being deformed for at least partially correcting an aberration, at least one second lens of the plurality of lenses furthermore being assigned at least one second manipulator, and the second lens being deformed in addition to the first lens. Furthermore, a method is described for selecting at least one lens of a plurality of lenses of a projection objective as actively deformable element, and a projection objective.

Imaging device in a projection exposure machine

An imaging device in a projection exposure machine for microlithography includes at least one optical element and at least one manipulator, a linear drive for manipulating the position of the optical element. The linear drive has at least one moving element, the moving element having a shearing part and a lifting part. The shearing part is arranged to move the optical element and the lifting part is arranged to move the shearing part. The linear drive has a supporting element which is in contact with and prevents movement of the optical element while the shearing part is moved by the lifting part.

An optical arrangement, in particular a microlithographic projection printing installation, has in particular a slot-shaped image field or rotationally non-symmetrical illumination. An optical element ( ) is therefore acted upon in a rotationally non-symmetrical manner by the radiation of a light source. To temper the optical element ( ), a supply apparatus ( to ) for gas is used. The latter having at least one supply line ( ) and at least one gas directing device ( ). The latter is aligned relative to the optical element ( ) and controllable in such a way that the gas is directed by the gas directing device ( ) towards the optical element ( ). The volumetric flow of the exiting gas therefore has a magnitude and spatial distribution ( ), which are adapted to the intensity distribution ( ) of the radiation. By virtue of such tempering, rotationally non-symmetrical light-induced image defects in the optical element ( ) are avoided or compensated.

Optical arrangement

An optical element ( ) of an optical system has at least one chamber ( ) that is sealed against atmospheric pressure and is enclosed by boundary surfaces and that has a fluid filling. At least one of the boundary surfaces of the chamber ( ) is exposed at least partially to illumination light. It is configured so that a change in the fluid pressure inside the chamber ( ) results in a change in non-rotational-symmetric imaging properties of the optical element ( ) having n-fold symmetry. For this purpose, a fluid source has a fluid connection to the chamber via a fluid supply line ( ). Furthermore, a control device is provided for the pressure in the fluid filling.

Optical system

An adjusting optical element mount ( ) serves for the position of two components ( ) in relation to one another, in particular of two carrier elements for optical elements, such as mirrors or lenses, in particular as an axial and/or angle manipulator for lithography lenses. The components ( ) can be adjusted in relation to one another via the action of force (F, T). Each of the components ( ) has at least three hinges ( ). Each of the hinges ( ) of one component ( ) is connected in each case to a corresponding hinge ( ) of the respectively other component ( ) to form a pair of hinges ( ) via a lever element ( , 6 ) in each case. Each of the pairs of hinges ( ) is connected in each case to at least one lever ( ) of at least one of the adjacent pairs of hinges ( ) via the at least one lever ( )and at least one further hinge ( &prime;) in each case.

Optical element mount comprising an optical element holding frame

An optical arrangement, in particular a microlithographic projection printing installation, has in particular a slot-shaped image field or rotationally non-symmetrical illumination. A refractive optical element, e.g. a lens ( ), is heated by the rotationally non-symmetrical radiated impingement ( ) of a light source. At least one electric heating element is coupled to the optical element. Said heating element comprises a resistance heating coating carried by the optical element. In the region of the surface ( ) of the optical element acted upon by the radiation of the light source the resistance heating coating is substantially optically transparent. It comprises a plurality of parallel, electrically mutually insulated coating strips ( to ). A heating current source ( to ) is additionally part of the heating element. By virtue of the combined heating of the optical element by the radiated impingement ( ) and the resistance heating, a correction of imaging defects induced by illumination in the optical element is achieved by means of a symmetrical and/or homogeneous temperature and refractive index distribution.

Optical arrangement having improved temperature distribution within an optical element

An optical system, in particular a microlithographic projection printing installation, has in particular a slot-shaped image field or rotationally non-symmetrical illumination. The system comprises a light source ( ) as well as at least one optical element, in particular a lens or a mirror. In the region of at least one surface acted upon by the radiation ( ) of the light source ( ) the optical element is substantially symmetrical in relation to an axis of rotational symmetry ( ). The optical element or its housing ( ) is rotatably connected to a frame ( ) by at least one bearing ( ). An actuator ( ) sets the optical element ( ) or its housing ( ) in rotation about the axis of rotational symmetry ( ). The actuation cooperates with a control device ( ). The latter activates the actuator ( ) for rotation of the optical element at least temporarily during the period, when the optical element is exposed to lumination. In such a manner rotationally non-symmetrical image defects are compensated.

Optical systems and methods of compensating rotationally non-symmetrical image defects in an optical system

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Aalen, Germany

Wolfgang Hummel