Merck Patent Gmbh

Merck Patent Gesellschaft MIT Beschrankter Haftung

Wolfgang Hierse

Nikolai (Mykola) Ignatyev

Andreas Bathe

Peer Kirsch

Elvira Montenegro

Nikolai Mykola Ignatyev

Martin Seidel

Thomas Eberle

Herwig Buchholz

Aurélie Ludemann

Susanne Heun

Junyou Pan

Helge Willner

Niels Schulte

Michael Schulte

Frank Egon Meyer

René Peter Scheurich

Eckhard Claus

Berthold Theo Hoge

Anne Julia Bader

Steffen Schellenberger

Rémi Manouk Anèmian

Waldemar Wiebe

Jan Krause

Melanie Kleineidam

The present invention relates to polymers comprising structural units having partially fluorinated substituents, to mixtures and formulations comprising the polymers according to the invention, to a process for the preparation of the polymers according to the invention, and to the use of the polymers according to the invention as functional materials in electronic devices.

Materials for electronic devices

The present invention relates to novel compounds containing fluorinated end groups, to the use thereof as surface-active substances, and to processes for the preparation of these compounds.

Fluorosurfactants

The present invention relates to functionalized fluoroalkylfluorophosphate salts, in particular as ionic liquids, to the preparation thereof and to the use thereof.

Functionalized fluoroalkyl fluorophosphate salts

The present invention relates to the use of phosphinic acids and/or phosphonic acids and salts thereof for wetting fluorine compounds, in particular fluoropolymers, to the use in coating solutions comprising fluorine compounds, and to polymerisation processes in which fluorine compounds are used and/or formed.

Use of phosphinic acids and/or phosphonic acids in polymerisation processes

The present invention relates to the use of phosphinic acids and/or phosphonic acids and salts thereof, preferably as surface-active compounds, in redox processes, in particular in electroplating technology, particularly preferably in electroplating baths, and to electroplating baths comprising these compounds.

Use of phosphinic acids and/or phosphonic acids in redox processes

The present invention relates to fatty acid esters of polyols or sulfonated fatty acid esters or sulfonated fatty acid amides containing at least one group Y, where Y stands for CF&#x2014;(CH)&#x2014;O&#x2014;, SF&#x2014;, CF&#x2014;(CH)&#x2014;S&#x2014;, CFCFS&#x2014;, [CF&#x2014;(CH)]N&#x2014; or [CF&#x2014;(CH)]NH&#x2014;, where a stands for an integer selected from the range from 0 to 5, or formula (I), where Rf stands for CF&#x2014;(CH)&#x2014;, CF&#x2014;(CH)&#x2014;O&#x2014;, CF&#x2014;(CH)&#x2014;S&#x2014;, CFCF&#x2014;S&#x2014;, SF&#x2014;(CH)&#x2014; or [CF&#x2014;(CH)]N&#x2014;, [CF&#x2014;(CH)]NH&#x2014; or (CF)N&#x2014;(CH)&#x2014;, B stands for a single bond, O, NH, NR, CH, C(O)&#x2014;O, C(O), S, CH&#x2014;O, O&#x2014;C(O), N&#x2014;C(O), C(O)&#x2014;N, O&#x2014;C(O)&#x2014;N, N&#x2014;C(O)&#x2014;N, O&#x2014;SOor SO&#x2014;O, R stands for alkyl having 1 to 4 C atoms, b stands for 0 or 1 and c stands for 0 or 1, q stands for 0 or 1, where at least one radical from b and q stands for 1, and r stands for 0, 1, 2, 3, 4 or 5, to processes for the preparation of these compounds, and to uses of these surface-active compounds. 

The present invention relates to fatty acid alkanolamides or polyolamides containing at least one group Y, where Y stands for CF&#x2014;(CH)&#x2014;O&#x2014;, SF&#x2014;, CF&#x2014;(CH)&#x2014;S&#x2014;, CFCFS&#x2014;, [CF&#x2014;(CH)]N&#x2014; or [CF&#x2014;(CH)]NH&#x2014;, where a stands for an integer selected from the range from 0 to 5, or formula (I), where Rf stands for CF&#x2014;(CH)&#x2014;, CF&#x2014;(CH)&#x2014;O&#x2014;, CF&#x2014;(CH)&#x2014;S&#x2014;, CFCF&#x2014;S&#x2014;, SF&#x2014;(CH)&#x2014; or [CF&#x2014;(CH)]N&#x2014;, [CF&#x2014;(CH)]NH&#x2014; or (CF)N&#x2014;(CH)&#x2014;, B stands for a single bond, O, NH, NR, CH, C(O)&#x2014;O, C(O), S, CH&#x2014;O, O&#x2014;C(O), N&#x2014;C(O), C(O)&#x2014;N, O&#x2014;C(O)&#x2014;N, N&#x2014;C(O)&#x2014;N, O&#x2014;SOor SO&#x2014;O, R stands for alkyl having 1 to 4 C atoms, b stands for 0 or 1 and c stands for 0 or 1, q stands for 0 or 1, where at least one radical from b and q stands for 1, and r stands for 0, 1, 2, 3, 4 or 5, to processes for the preparation of these compounds, and to uses of these surface-active compounds.

Growing community of inventors

Gross-Zimmern, Germany

Wolfgang Hierse