Infineon Technologies Ag

Qimonda Ag

Wolfgang Henke

Rolf Weis

Till Schloesser

Gerhard Kunkel

Ulrike Gruening-von Schwerin

Boris Habets

Florian Schnabel

Odo Wunnicke

G&uuml;nther Czech

Wolfgang Mueller

Michiel Kupers

Carsten F&uuml;lber

Alignment data from an exposure tool suitable for exposing a plurality of semiconductor wafers are provided, the alignment data including alignment values applied by the exposure tool to respective ones of the plurality of semiconductor wafers at a plurality of measured positions.

Alignment calculation

A method of forming an integrated circuit having a capacitor is disclosed. In one embodiment, the method includes forming a capacitor element with a first electrode, a dielectric layer and a second electrode. The capacitor element is formed using a support layer.

Method of producing an integrated circuit having a capacitor with a supporting layer

A first and a second phase-shifting, semitransparent layer are formed on a substrate. The layers are patterned lithographically to form first elevated structure elements on the substrate with a first degree of transmission and second structure elements with a second degree of transmission, where the second degree of transmission is different from the first degree of transmission. Memory products can be produced with high resolution and high dimensional accuracy when the structure elements are transferred to a semiconductor substrate, by virtue of dense structure arrangements being represented by the structure elements with a high degree of transmission of more than 30% and, on the same mask, isolated structure arrangements having a low density being represented by the structure elements with a lower degree of transmission.

Method for producing a phase mask

The photomask and the associated method of lithography and mask technique enable production of a regular configuration of resist dots or holes. At least one photomask is a phase mask. The method is useful for the production of magnetic memory components, in particular MRAM memories, having elliptically shaped magnetic memory elements of high density.

Photomask, method of lithographically structuring a photoresist layer with the photomask, and method of producing magnetic memory elements

Growing community of inventors

Radebeul, Germany

Wolfgang Henke