Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung E.V.

Siemens Aktiengesellschaft

Festo Ag & Co

Wolfgang Benecke

Rolf Hagedorn

Gunter Fuhr

Bernd Wagner

Bernhard Wagner

Jan Gimsa

Uwe Schnakenberg

Roland Glaser

Burkhard Lischke

Josef Binder

Frank J Langro

Frank Latino

Oliver Ahrens

Hans Joachim Quenzer

Karl-Heinz Förster

Karl-Heinz F&ouml;rster

Thomas Stärz

Thomas St&auml;rz

Thorsten Muller

Werner Riethmuller

A circuit board, which includes one or more sensors, is integrated in a fluid control device, such as a valve manifold and a base plate. The fluid control device selectively directs a fluid used to control pneumatic or hydraulic equipment. The sensors are used to measure physical characteristics of the fluid, such as flow rate, pressure, and temperature. A flow sensor includes a paddle and a support member. The paddle is disposed at least partially in an orifice and is displaced in response to fluid flow. The support member positions the paddle in the orifice and includes a plurality of strain gauges. The strain gauges are disposed on only one side of the support member and are mechanically stressed in response to the paddle being displaced by the fluid flow.

Integrated fluid sensing device

A circuit board, which includes one or more sensors, is integrated in a fluid control device, such as a valve manifold and a base plate. The fluid control device selectively directs a fluid used to control pneumatic or hydraulic equipment. The sensors are used to measure physical characteristics of the fluid, such as flow rate, pressure, and temperature.

Disclosed is a process for manipulating microscopic dielectric particles in which particles are exposed to an electric field. In disadvantaged processes the particles are exposed to inhomogeneous electric field and are polarized by them. The polarized particles are moved in the direction of higher field strength. These processes permit no reversal of the traveling direction of the particles. The particles are enriched at the electrode so that they cannot be retained in free space. In the invented process the particles are exposed to high-frequency field traveling in one or more prescribed direction, by which the particles are subject to a force which sets them in a motion that is strongly synchronous to the field. With the aid of a device for carrying out the invented process, the particles can be manipulated very flexibly. By means of linearly or circularly disposed electrodes, the particles can be moved on linear paths in any direction including through branched microstructures, they can be separated according to their dielectric properties and retained without contact. Applications are in the fields of biotechnology and molecular separation, focussing and microtransport technology.

Process for manipulating microscopic, dielectric particles and a device

Dielectric motor

Dielectric micromechanical element

Method of continuously separating mixtures of microscopic dielectric

The present invention relates to a dielectric motor which is driven by means of electric fields. The motor is distinguished by two or more dielectric rotors being disposed in a central region which is surrounded by several electrodes. The rotors may be made of different dielectric materials and be electrically axially asymmetric in design. They are driven by continuously or discontinuously rotating electric fields. Depending on the geometric and electric design, very variable rotation conditions can be achieved, which can be simply controlled via the frequency of the rotating fields. The motor is suited for switch and drive purposes and can be utilized to construct microdosing devices, pumps and valves.

Electric motor

Direct substrate bonding

A micromanipulator suited for use in vacuum and microscopic systems is prded for moving objects permitting variable step spans up to approximately 100 .mu.m while having high precision of movement and a high degree of miniaturization. The micromanipulator is equipped with bimaterial tongues which can be positioned with the aid of heating and sensor elements. The object carrier is moved by suitable coordination of the tongue movements. The micromanipulator permits any desired movements in a plane and rotary and tilting movements of the object carrier.

Micromanipulator for moving objects

Apparatus for measuring mechanical forces and force actions

Disclosed is a micromechanical manipulator composed of substrate 1, heating lements and a manipulator arm 2 which is based on the principle of the bimaterial effect. Prior art bimaterial manipulators execute movements perpendicular to the surface of the substrate. However, it is often desirable to have a manipulator which executes movements in the surface of the substrate. The invented manipulator is based on the substrate surface counteracting steering of the manipulator arm with mechanical resistance, which leads to bulging and shortening of the effective length of the arm and thereby to movement in the surface of the substrate. The invented manipulator arm is suited as a drive means for elements, such as toothed disks or joints, which are movably disposed in the surface of the substrate.

Micromechanical manipulator

Micromanipulator for gripping objects

Instrument for measuring accelerations and process of making the same

Methods for producing beam shaping diaphragms for lithographic devices in which a silicon layer is epitaxially deposited on a semiconductor body and the epitaxial layer is formed in the central region as a self-supporting membrane and is formed with preferably straight line-shaped quadratic recesses which have perpendicular limiting surfaces. Photolithographic processes and galvanic second-casting techniques may be used in the process for producing the beam-shaping diaphragm. The beam-shaping diaphragm can also be produced in lightly doped epitaxial layers by using electro-chemical etching methods.

Method for producing beam-shaping diaphragms for lithographic devices

A method for manufacturing a control plate for a lithographic device. The control plate manufactured with a method of the present invention is essentially composed of a semiconductor substrate having an opening for the passage of particle probes emanating from a multi-beam source and of a corresponding plurality of deflection elements that are connected via bond pads and connecting lines to the electronics of the lithographic device that generates control signals. Lithographic methods and voltaic shaping techniques are utilized for the manufacture of the deflection elements located on the semiconductor substrate which is coated with a dielectric.

Method for manufacturing a control plate for a lithographic device

Growing community of inventors

Berlin, Germany

Wolfgang Benecke