University of Minnesota

Wladyslaw W Szymanski

Benjamin Y Liu

A particle measurement apparatus for obtaining accurate information relating to airborne particles in a gas under vacuum from a process chamber including a sampling chamber which can be subjected to a very strong vacuum and used for obtaining a sample of the gas in the process chamber. The interior of the sampling chamber is first flushed with very clean purge gas, and subsequently opened to the process vacuum chamber which is to be sampled so that a sample of the atmosphere of gas from the process vacuum chamber is held in the sampling chamber. The sampling chamber is sealed from the process chamber and the sample is brought to atmospheric pressure by adding a particle-free purified gas. The sample is then flushed from the sampling chamber and passed through a particle counter. Calculations can then be made to determine the original particle concentration in the process vacuum chamber based on the measured particle concentration from the sample of the sampling chamber. By having a series of valves operated in a selected sequence, a very accurate measurement of particles down to as small as 0.01 microns can be measured, and the system can be used to measure particles in chambers under from about one atmosphere to approximately 0.001 atmosphere.

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Vienna, Australia

Wladyslaw W Szymanski