Western Digital (fremont), Inc.

Chips and Technologies, Llc.

Qlogic Corporation

Winnie Yu

Hai Sun

Hongping Yuan

Yizhong Wang

Xianzhong Zeng

Liubo Hong

James S Blomgren

Tuan Luong

Rowena Schmidt

Hong Zhang

Honglin Zhu

Weimin Si

Kanoj Sarcar

Lijie Zhao

Methods and systems for routing frames are provided. A routing module of a network device stores a destination address for a virtual machine with a virtual bridge identifier associated with a virtual bridge. The virtual bridge identifier is associated with a queue pair that is used by the virtual machine to send and receive information using the virtual bridge. The network device also includes a port connected to a link for sending and receiving the information and the virtual bridge is associated with the port. The routing module is used to determine the destination of a frame whether the frame is sent by an external device or the virtual machine.

Method and system for communication in a virtual machine environment

A method and system provide microelectric devices on fields on a substrate. Each field includes at least one microelectric device having a critical device feature and remaining device feature(s) distal from the critical device feature. The method and system include providing a photoresist layer for fabricating the microelectric devices and exposing the photoresist layer using a dark field mask. The dark field mask is for defining a critical mask feature corresponding to the critical device feature and exposing a first portion of the fields. The first portion includes not more than five percent of each field. The method and system further include exposing the photoresist layer using a clear field mask. The clear field mask is for defining remaining mask feature(s) corresponding to the remaining device feature(s). The clear field mask exposes a second portion of the fields that is different from the first portion.

Method and system for exposing photoresist in a microelectric device

A method and system provide a magnetoresistive structure from a magnetoresistive stack that includes a plurality of layers. The method and system include providing a mask that exposes a portion of the magnetoresistive stack. The mask has at least one side, a top, and a base at least as wide as the top. The method and system also include removing the portion of the magnetoresistive stack to define the magnetoresistive structure. The method and system further include providing an insulating layer. A portion of the insulating layer resides on the at least one side of the mask. The method and system further include removing the portion of the insulating layer on the at least one side of the mask and removing the mask.

Method and system for providing a magnetoresistive structure using undercut free mask

A method and system for exposing a plurality of fields on a substrate. The substrate has a center and an edge. The fields include a plurality of rows. The method and system include determining an exposure sequence for the plurality of fields. Each of the plurality of fields has a distance from the center and a placement in the exposure sequence. The placement of a field in the exposure sequence is based on the distance and excludes placing each of the plurality of fields in a row of the plurality of rows next to an adjacent field in the row in combination with placing each of the plurality of rows next to an adjacent row. The method and system also include exposing the plurality of fields in the exposure sequence in order of the placement.

Method and system for exposing a photoresist in a magnetic device

A method of lifting off photoresist beneath an overlayer includes providing a structure including photoresist and depositing an overlayer impenetrable to a liftoff solution over the photoresist and a field region around the structure. The method also includes forming a mask over the structure and ion milling to remove the overlayer in the field region not covered by the mask. The method then includes lifting off the photoresist using the liftoff solution.

Method and apparatus for lifting off photoresist beneath an overlayer

A method and system for providing a magnetic writer are described. The method and system include providing a bottom antireflective coating (BARC) on a portion of the magnetic writer. The BARC has a low reflectivity. The method and system also include providing a barrier layer on at least a portion of the BAR and providing a mask on at least a portion of the barrier layer. The barrier layer isolates the BARC from the mask.

Method and system for providing a magnetic writer using a BARC

A method and system for providing a microelectric device, such as a magnetoresistive read sensor are described. The method and system include providing a mask layer on the microelectric device. The method and system further include exposing the mask layer to provide a mask. A portion of the mask covers a portion of the microelectric device. The step of exposing the mask layer further includes utilizing a chromeless alt-phase shift mask for providing the portion of the mask.

Method and system for providing a structure in a microelectronic device using a chromeless alternating phase shift mask

A method and system for providing a microelectric device are described. The method and system include providing a photoresist layer having a surface. The method and system also include setting a focus range and exposing the photoresist layer over the focus range to form a photoresist mask having a trench therein. The focus range corresponding to a plurality of focus distances. The focus range also corresponds to a nonzero angle to be formed in the photoresist layer and to the structure. The trench has at least one sidewall that forms the angle with a normal to the surface. The method and system also include providing the structure utilizing the trench.

Method and system for providing a microelectronic device using a plurality of focus distances

A method and system for fabricating a magnetic recording device are described. The method and system include providing a mask layer on the magnetic recording device and imprinting a pattern in the mask layer to form a mask. The method and system also include transferring the pattern from the mask to the magnetic recording device. In another aspect, the method and system include providing a malleable mask layer on the magnetic recording device. In this aspect, the method and system also include depressing an imprint mask into the mask layer and curing the mask layer while the imprint mask is depressed into the mask layer to provide a mask having a pattern. The pattern may correspond to a read sensor and/or a perpendicular magnetic recording pole. The method and system also include transferring the pattern from the mask to the magnetic recording device.

Methods for fabricating a magnetic recording device

A mask for transferring a pattern for portion of a magnetic recording transducer is disclosed. The masks includes one corner corresponding to an angle of more than ninety degrees and less than one hundred eighty degrees. The mask also includes at least one rectangular serif residing at the corner.

Method and system for providing optical proximity correction for structures such as a PMR nose

An improved system for checking for segmentation violations counts the total number of bytes accessed from the control segment following a control transfer operation. If the count indicates that a part of an instruction is fetched from outside the control segment a limit exception occurs.

System for detecting boundary cross-over of instruction memory space

A method and apparatus for performing a fast jump address calculation is disclosed. A field from the instruction is provided to an adder, on the assumption that it is the displacement value, without actually determining whether it is a displacement value. A fixed instruction length is also provided to the adder, on the assumption that the instruction will have that length. Finally, the current instruction address bits from the program counter are provided to the adder. These are added together to provide a jump address.

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San Jose, CA, United States of America

Winnie Yu