Infineon Technologies Ag

Avago Technologies Wireless IP (singapore) Pte. Ltd.

Avago Technologies Wireless Ip, Pte. Ltd.

Contria San Limited Liability Company

Winfried Nessler

Robert Aigner

Stephan Marksteiner

Martin Handtmann

Lueder Elbrecht

Martin Franosch

Hans-Joerg Timme

Andreas Meckes

Lüder Elbrecht

Gernot G Fattinger

Jyrki Kaitila

Robert Thalhammer

Klaus Diefenbeck

Thomas Rainer Herzog

Peter Mueller

Elbrecht Lueder

In a method for manufacturing a piezoelectric oscillating circuit in thin film technology, wherein the oscillating circuit includes a predetermined natural frequency and a plurality of layers, first of all at least a first layer of the piezoelectric oscillating circuit is generated. Subsequently, by processing the first layer a frequency correction is performed. Subsequently, at least a second layer of the piezoelectric oscillating circuit is generated and processed for performing a second frequency correction.

Piezoelectric oscillating circuit, method for manufacturing the same and filter arrangement

An apparatus includes a first bulk acoustic wave (BAW) device including a first impedance and a second BAW device including a second impedance, wherein the first and second impedances are different and the first and second BAW devices are acoustically coupled.

Apparatus with acoustically coupled BAW resonators and a method for matching impedances

Apparatus for housing a micromechanical structure, and a method for producing the housing. The apparatus has a substrate having a main side on which the micromechanical structure is formed, a photo-resist material structure surrounding the micromechanical structure to form a cavity together with the substrate between the substrate and the photo-resist material structure, wherein the cavity separates the micromechanical structure and the photo-resist material structure and has an opening, and a closure for closing the opening to close the cavity.

Apparatus for housing a micromechanical structure

In a method of producing an electrode for a resonator in thin-film technology, the electrode of the resonator is embedded in an insulating layer such that a surface of the electrode is exposed, and that a surface defined by the electrode and the insulating layer is substantially planar.

Method of producing a topology-optimized electrode for a resonator in thin-film technology

A method for manufacturing a coupled resonator device includes forming a first part of a plurality of layers, trimming an exposed layer of the first part and forming a remaining part of the plurality of layers. The coupled resonator device includes a stack of the plurality of layers, the plurality of layers including a first piezo-layer with a first and a second electrode layer sandwiching the first piezo-layer, a second piezo-layer with a first and a second electrode layer sandwiching the second piezo-layer, the first and second piezo-layers being acoustically coupled to each other.

Piezoelectric resonator structure and method for manufacturing a coupled resonator device

A piezoelectric component comprises at least two stacked crystal filters on a substrate. Each stacked crystal filter comprises a bottom electrode, a first piezoelectric layer arranged above the bottom electrode, a central electrode arranged above the first piezoelectric layer, a second piezoelectric layer arranged above the central electrode, and a top electrode arranged above the second piezoelectric layer. The bottom electrodes are directly connected to one another and the central electrodes are directly connected to one another.

Piezoelectric component and method for producing it

A method for producing a piezoelectric component comprising at least two stacked crystal filters comprises the steps of depositing of the layer stack above the bottom electrode and the subsequent patterning of the upper electrically conductive layer and, if appropriate, second piezoelectric layers. Thus, it is possible, in a simple manner, with a minimum of process steps, to produce a piezoelectric component comprising two stacked crystal filters which are directly connected to one another via their bottom and central electrodes. The piezoelectric component furthermore has the advantage that applications in which a high stop band attenuation is important can be realized with a relatively small number of filter stages. In this case, through the use of at least two stacked crystal filters, it is possible to achieve an excellent out-of-band rejection also for 'single-ended signals'.

Method of producing a piezoelectric component

Apparatus for housing a micromechanical structure and method for producing the same

A BAW resonator includes a first piezoelectric layer made of a material oriented toward a first direction, and a second piezoelectric layer made of a material oriented toward a second direction which is opposed to the first direction. The first piezoelectric layer and the second piezoelectric layer are acoustically coupled with each other.

BAW resonator having piezoelectric layers oriented in opposed directions

The invention relates to bulk acoustic wave filters including at least two bulk acoustic wave resonators. Each of these resonators includes at least one first electrode, a piezoelectric layer, and a second electrode. At least two of the bulk acoustic wave resonators have effective resonator surfaces which differ in their surface form and/or surface content. The inventive design of the bulk acoustic wave resonators enables optimal suppression of interference modes without influencing the impedance level of the filter.

Bulk acoustic wave filter utilizing resonators with different aspect ratios

A semiconductor component is provided having a layer sequence for conversion of acoustic to thermal signals and electrical voltage changes to one another, as well as a process for its production. The layer sequence has a lower electrode, an upper electrode and a layer which is arranged between them and is piezoelectrical or pyroelectrical. An auxiliary layer is arranged between the lower electrode and the layer and is used for homogeneously oriented growth of the layer during the production process. The auxiliary layer preferably consists essentially of amorphous silicon, amorphous silicon oxide or amorphous silicon nitride.

Semiconductor element comprising a sequence of layers for converting acoustic or thermal signal and electrical voltage changes into each other and method for producing the same

A resonator device includes a piezoelectric resonator having a detuning layer sequence arranged on the piezoelectric resonator. The detuning layer sequence includes at least a first layer having a high acoustic impedance and a second layer having a low acoustic impedance.

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Munich, Germany

Winfried Nessler