Asml Netherlands B.v.

Wim Symens

Johannes Onvlee

Antonius Franciscus Johannes De Groot

David Ferdinand Vles

Hans Butler

Bas Jansen

A substrate support for supporting a substrate. The substrate support includes a main body, a clamping device and a dither device. The main body includes a support surface for supporting the substrate. The clamping device is arranged to provide the clamping force to clamp the substrate on the support surface. The dither device is configured to dither the clamping force. The dither device may be configured to dither the clamping force while the substrate is being loaded onto the support surface.

Substrate support, lithographic apparatus and loading method

A substrate support for supporting a substrate. The substrate support comprises a main body, a clamping device and a dither device. The main body comprises a support surface for supporting the substrate. The clamping device is arranged to provide the clamping force to clamp the substrate on the support surface. The dither device is configured to dither the clamping force. The dither device may be configured to dither the clamping force while the substrate W is being loaded onto the support surface.

A positioning system including: a first body; a second body; and an actuator arranged between the first body and the second body to position the first body relative to the second body, wherein the actuator includes a first piezoelectric actuator and a second piezoelectric actuator arranged in series, wherein the first piezoelectric actuator has a first hysteresis, wherein the second piezoelectric actuator has a second hysteresis smaller than the first hysteresis, and wherein the second piezoelectric actuator has a positioning range at least equal to the first hysteresis.

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Leuven, Belgium

Wim Symens