Asml Netherlands B.v.

Wim Ronald Kampinga

Jan Okke Nieuwenkamp

Nicolaas Ten Kate

Hans Jansen

Michel Riepen

Dzmitry Labetski

Hendrikus Gijsbertus Schimmel

Johannes Christiaan Leonardus Franken

Ramin Badie

Henricus Jozef Castelijns

Reinier Theodorus Martinus Jilisen

Wilbert Jan Mestrom

Albert Pieter Rijpma

Dennis Jozef Maria Paulussen

Peter Van Putten

Jacob Brinkert

Gerrit Van Der Straaten

Brian Vernon Virgo

Johan Frederik Dijksman

Georgiy Olegovich Vaschenko

Bastiaan Lambertus Wilhelmus Marinus Van De Ven

Peter Michael Baumgart

Wilhelmus Henricus Theodorus Maria Aangenent

Koen Gerhardus Winkels

Theodorus Wilhelmus Driessen

Jari Ruotsalainen

Droplet generators, such as used in an EUV radiation source, and associated EUV radiation sources and lithographic apparatuses. A droplet generator can include a nozzle assembly to emit the fuel as droplets, the nozzle assembly being within a pressurized environment at substantially the same pressure as the fuel pressure within the droplet generator. A droplet generator can include an actuator in contact with and biased against a pump chamber by means of a biasing mechanism having an actuator support biased against the actuator. The actuator acts on the fuel within the pump chamber to create droplets. The actuator support has a material with a greater coefficient of thermal expansion than its surrounding structure, such that it is moveable within the surrounding structure at ambient temperature, but expands against the surrounding structure at an operating temperature, so as to clamp the actuator support against the surrounding structure at the operating temperature.

Droplet generator for lithographic apparatus, EUV source and lithographic apparatus

A radiation source comprising a fuel source configured to deliver fuel to a location from which the fuel emits EUV radiation. The radiation source further comprises an immobile fuel debris receiving surface provided with a plurality of grooves. The grooves have orientations which are arranged to direct the flow of liquid fuel under the influence of gravity in one or more desired directions.

Radiation source and lithographic apparatus

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Enschede, Netherlands

Wim Ronald Kampinga