1. Intel Corporation (346 from 54,445 patents)

2. Sony Group Corporation (7 from 3,303 patents)

3. Sony Corporation (3 from 58,123 patents)

4. Google Inc. (2 from 32,215 patents)

5. Tahoe Research, Ltd. (1 from 81 patents)

6. Intel Corporatuon (1 from 1 patent)

1. 12433007 - Transistor gate trench engineering to decrease capacitance and resistance

2. 12388011 - Top gate recessed channel CMOS thin film transistor and methods of fabrication

3. 12369399 - Gate-to-gate isolation for stacked transistor architecture via selective dielectric deposition structure

4. 12363967 - Integration methods to fabricate internal spacers for nanowire devices

5. 12342614 - Asymmetric gate structures and contacts for stacked transistors

6. 12288807 - Amorphization and regrowth of source-drain regions from the bottom-side of a semiconductor assembly

7. 12288813 - Gate-all-around integrated circuit structures having insulator fin on insulator substrate

8. 12288803 - Transistor with isolation below source and drain

9. 12266570 - Self-aligned interconnect structures and methods of fabrication

10. 12255137 - Sideways vias in isolation areas to contact interior layers in stacked devices

11. 12224202 - Forming an oxide volume within a fin

12. 12199142 - Neighboring gate-all-around integrated circuit structures having conductive contact stressor between epitaxial source or drain regions

13. 12183668 - Thin-film transistors and MIM capacitors in exclusion zones

14. 12176408 - Localized spacer for nanowire transistors and methods of fabrication

15. RE50222 - Non-planar gate all-around device and method of fabrication thereof