Rohm & Haas Electronic Materials LLC

Inotek Pharmaceuticals Corporation

William Williams, Iii

Emad Aqad

James F Cameron

Cheng-Bai Xu

Mingqi Li

Shintaro Yamada

Cong Liu

Prakash Jagtap

Aloka Roy

Peter Trefonas, Iii

Suzanne M Coley

Paul J LaBeaume

Andrew L Salzman

Csaba Szabo

Li Cui

Christopher D Gilmore

Garry Southan

Chi-Wan Lee

Charlotte A Cutler

Qiuzhe Xie

A photoresist composition, including an acid-sensitive polymer and photoacid generator compound having Formula (I): wherein, EWG, Y, R, and Mare the same as described in the specification.

Photoresist composition, coated substrate including the photoresist composition, and method of forming electronic device

Methods of manufacturing electronic devices employing wet-strippable underlayer compositions comprising a condensate and/or hydrolyzate of a polymer comprising as polymerized units one or more first unsaturated monomers having a condensable silicon-containing moiety, wherein the condensable silicon-containing moiety is pendent to the polymer backbone, and one or more condensable silicon monomers are provided.

Method using silicon-containing underlayers

New photoresist compositions are provided that comprise a carbamate compound that comprises 1) a carbamate group and 2) an ester group. Preferred photoresists of the invention may comprise a resin with acid-labile groups; an acid generator compound; and a carbamate compound that can function to decrease undesired photogenerated-acid diffusion out of unexposed regions of a photoresist coating layer.

Photoresists comprising carbamate component

A photoacid generator compound having Formula (I): wherein, EWG, Y, R, and Mare the same as described in the specification.

Photoacid generator

Solar screen with plantation and grid

Solar screen with plantation shutter

A photoacid-generating compound has the structure where R, R, R, R, Q, and X are defined herein. The photoacid-generating compound can be used as a component of a photoresist composition, or as a monomer incorporated into a polymer useful in a photoresist composition. The photoacid-generating compound provides a desired balance of solubility and line width roughness.

Photoacid-generating compound, polymer derived therefrom, photoresist composition including the photoacid-generating compound or polymer, and method of forming a photoresist relief image

A method of separating a secondary alcohol compound from a primary alcohol compound using selective acylation is provided.

Purification method

A photoacid generator compound has the formula (I):[A-(CHR)]-(L)-(CH)&#x2014;(C(R))SOZ&#x2003;&#x2003;(I)wherein A is a substituted or unsubstituted, monocyclic, polycyclic, or fused polycyclic Cor greater cycloaliphatic group optionally comprising O, S, N, F, or a combination comprising at least one of the foregoing, Ris H, a single bond, or a substituted or unsubstituted Calkyl group, wherein when Ris a single bond, Ris covalently bonded to a carbon atom of A, each Ris independently H, F, or Cfluoroalkyl, wherein at least one Ris not hydrogen, L is a linking group comprising a sulfonate group, a sulfonamide group, or a Csulfonate or sulfonamide-containing group, Z is an organic or inorganic cation, p is an integer of 0 to 10, k is 1 or 2, m is an integer of 0 or greater, and n is an integer of 1 or greater. A precursor compound to the photoacid generator, a photoresist composition including the photoacid generator, and a substrate coated with the photoresist composition, are also disclosed.

Photoacid generator and photoresist comprising same

A photoacid generator includes those of formula (I): wherein each Rin formula 1 is independently H, F, a Cnonfluorinated organic group, Cfluorinated organic group, or a combination comprising at least one of the foregoing, provided at least one Ris F or a Cfluorinated organic group, the Cfluorinated and nonfluorinated organic groups each optionally comprising O, S, N, or a combination comprising at least one of the foregoing heteroatoms; Lis a linking group comprising a heteroatom comprising O, S, N, F, or a combination comprising at least one of the foregoing; Gis an onium salt of the formula (II): wherein in formula (II), X is S or I, each Ris independently Calkyl group; a polycyclic or monocyclic Ccycloalkyl group; a polycyclic or monocyclic Caryl group; or a combination comprising at least one of the foregoing, provided at least one Ris substituted where each Ris a Cmonocyclic aryl group, and wherein when X is I, a is 2, and where X is S, a is 3, p is 0 or 1, and q is an integer of from 1 to 10.

A photoacid generator compound has the formula (I):[A-(CHR)]-(L)-(CH)&#x2014;(C(R))&#x2014;SOZ&#x2003;&#x2003;(I)wherein A is a substituted or unsubstituted, monocyclic, polycyclic, or fused polycyclic Cor greater cycloaliphatic group optionally comprising O, S, N, F, or a combination comprising at least one of the foregoing, Ris H, a single bond, or a substituted or unsubstituted Calkyl group, wherein when Ris a single bond, Ris covalently bonded to a carbon atom of A, each Ris independently H, F, or Cfluoroalkyl, wherein at least one Ris not hydrogen, L is a linking group comprising a sulfonate group, a sulfonamide group, or a Csulfonate or sulfonamide-containing group, Z is an organic or inorganic cation, p is an integer of 0 to 10,k is 1 or 2, m is an integer of 0 or greater, and n is an integer of 1 or greater. A precursor compound to the photoacid generator, a photoresist composition including the photoacid generator, and a substrate coated with the photoresist composition, are also disclosed.

Growing community of inventors

Ipswich, MA, United States of America

William Williams, Iii