Kla-tencor Technologies Corporation

Other

Kla Tencor Corporation

William Volk

Carl Hess

James Norman Wiley

Ellis Chang

Sagar A Kekare

Sterling G Watson

Sharon McCauley

Paul Frank Marella

Gaurav Verma

Bo Su

Ben Eynon

Harold William Lehon

Brian Grenon

Laurence Wagner

Methods and systems for inspection of wafers and reticles using designer intent data are provided. One computer-implemented method includes identifying nuisance defects on a wafer based on inspection data produced by inspection of a reticle, which is used to form a pattern on the wafer prior to inspection of the wafer. Another computer-implemented method includes detecting defects on a wafer by analyzing data generated by inspection of the water in combination with data representative of a reticle, which includes designations identifying different types of portions of the reticle. An additional computer-implemented method includes determining a property of a manufacturing process used to process a wafer based on defects that alter a characteristic of a device formed on the wafer. Further computer-implemented methods include altering or simulating one or more characteristics of a design of an integrated circuit based on data generated by inspection of a wafer.

Methods and systems for inspection of wafers and reticles using designer intent data

Methods and systems for inspection of wafers and reticles using designer intent data are provided. One computer-implemented method includes identifying nuisance defects on a wafer based on inspection data produced by inspection of a reticle, which is used to form a pattern on the wafer prior to inspection of the wafer. Another computer-implemented method includes detecting defects on a wafer by analyzing data generated by inspection of the wafer in combination with data representative of a reticle, which includes designations identifying different types of portions of the reticle. An additional computer-implemented method includes determining a property of a manufacturing process used to process a wafer based on defects that alter a characteristic of a device formed on the wafer. Further computer-implemented methods include altering or simulating one or more characteristics of a design of an integrated circuit based on data generated by inspection of a wafer.

A method of inspecting a mask, where a structure on the mask is optically imaged at a resolution specified by a criteria set including at least one of a method by which the structure was formed, a tolerance, and a structure type, to produce an optical image. The optical image is compared to a baseline image, and the differences between the optical image and the baseline image are identified. The differences are compared to a threshold value, and any differences that exceed the threshold value are flagged as defects.

Mask inspection

Computer-implemented methods and systems for determining different process windows for a wafer printing process for different reticle designs are provided. One method includes generating simulated images illustrating how each of the different reticle designs will be printed on a wafer at different values of one or more parameters of the wafer printing process. The method also includes detecting defects in each of the different reticle designs using the simulated images. In addition, the method includes determining a process window for the wafer printing process for each of the different reticle designs based on results of the detecting step.

Computer-implemented methods and systems for determining different process windows for a wafer printing process for different reticle designs

Photolithography masks, systems and methods and more particularly to photolithography masks systems and methods for making and using silicon dioxide mask substrates are disclosed. The mask generally includes a silicon-dioxide mask substrate having a front surface, a patterned layer disposed on the front surface, and a coating of a fluoride of an element of group IIA that covers the patterned layer. The coating reduces undesired crystal growth on the silicon dioxide mask substrate. Such masks can be incorporated into photolithography systems and used in photolithography methods wherein a layer of photoresist is formed on a substrate and to radiation that impinges on the mask. Such a mask can be fabricated, e.g., by forming a patterned layer on a front surface of a silicon dioxide mask substrate and covering the patterned layer with a coating of a fluoride of an element of group IIA.

Films for prevention of crystal growth on fused silica substrates for semiconductor lithography

Photolithographic masks and nano-imprint lithography masks with calcium fluoride substrates are disclosed. A photolithographic mask has a calcium fluoride substrate having a surface, a patterned layer disposed on the surface, and a polymer layer forming a pellicle that covers the patterned layer. A mask for nano-imprint lithography has a calcium fluoride substrate with a surface and a nano-imprint lithography pattern formed on the surface. Such masks can be used in a method for reducing the effects of hydration during lithography. In the method a layer of photoresist is formed on a substrate. A mask having a substrate made of calcium fluoride with a patterned surface is disposed proximate the layer of photoresist. The photoresist is exposed to radiation that passes through the mask. The radiation is characterized by a vacuum wavelength between about 190 nm and about 450 nm. Calcium fluoride masks can also be used to reduce the effects of hydration nano-imprint lithography.

Use of calcium fluoride substrate for lithography masks

A timed alert device for vehicles having an electronic timer that counts down a specified time period. An audible alert coupled to the electronic timer projects a sound when the electronic timer has reached a prescribed time. A first actuating element is coupled to the electronic timer which deactivates the audible alert when depressed. A power source is coupled to and supplies power to the electronic timer. A visual alert illuminates when the electronic timer has reached a prescribed time. Depressing a second actuating element deactivates the visual alert.

Timed alert device for vehicles

An interlockable reusable container for a food product, especially for a leftover piece of pizza pie, made of a thermoplastic material comprising a pie-shaped base, two substantially flat side walls attached to the base meeting in a common vertex, one of these side walls having an exterior tongue member and the other having an exterior groove member which are shaped so that the reusable container is laterally interlockable with another reusable container, a rear wall attached to the side walls and the base and a removable lid having a lid panel which rests on the side walls and a plug member which fits in the top opening of the reusable container when the lid is in place on the container. The lid panel and base may have a similar tongue and groove system so that the reusable containers can be stacked compactly in stable vertical stacks. An optional ceramic heat retention plate having a plurality of feet members shaped to just fit in the reusable container resting on the base of the reusable container can be provided.

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San Francisco, CA, United States of America

William Volk