Mks Instruments, Inc.

William Stenglein

David J Coumou

Aaron T Radomski

Larry J Fisk, Ii

Richard Pham

Paul Eyerman

Carl Ioriatti

A radio frequency (RF) system includes a control module that allocates M predetermined frequency intervals. The system also includes N RF sources that each applies first RF power to electrodes within a plasma chamber at frequencies within an assigned respective one of the M predetermined frequency intervals. The N RF sources also each respond to second RF power including feedback from the plasma chamber. The N RF sources each include a processing module that adjusts the first RF power based on the second RF power and the respective one of the M predetermined frequency intervals. M and N are integers greater than 1.

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Churchville, NY, United States of America

William Stenglein