Infineon Technologies Richmond, LP

Infineon Technologies Ag

Brewer Science, Inc.

William Roberts

Christopher Gould

Gerhard Kunkel

Douglas J Guerrero

Karl Schumacher

Marlene Strobl

Igor Jekauc

Patrick Lomtscher

Nicholas Louka

Diem-Thy Ngu-Uyen Tran

Paul Jowett

Nicholas Clements

Karen Anne Davidson

Winifried Sabisch

Paul Williams

Alice F Martin

A method and apparatus according to the present invention define optimal conditions for a scanning electron microscope (SEM), preferably a critical dimension scanning electron microscope (CDSEM). The present invention provides an image quality monitor that utilizes image processing and optimization to maintain image quality at a desired level. Images from a stage sample are automatically collected, while microscope operational parameters are determined based on image processing to enable continuous monitoring of microscope operation. The technique may be performed manually or automatically and generates set points for beam conditioning elements to produce or maintain ideal beam conditions to enhance image quality. The present invention generates data indicating optimized values for each beam alignment parameter. The optimized values are applied to the internal microscope values to optimize the beam. The results may be provided to the technician, a data storage system or directly to the microscope control mechanisms.

Method and apparatus for automated beam optimization in a scanning electron microscope

An inspection system includes an illumination source configured to illuminate a blazed phase grating sample, image collection pathways and an imaging system configured to capture an image of a sample point of the blazed phase grating sample, and a controller configured to adjust the illumination source in response to an analysis of the image of the sample point to determine illumination uniformity of the inspection system.

Optimizing light path uniformity in inspection systems

A method of controlling lithographic overlay offsets in the manufacture of semiconductor devices from wafers, comprising the steps of forming a lithographic pattern on a wafer layer with a lithographic tool, processing the wafer after the pattern is formed to enable fabrication of a semiconductor device, predicting overlay offset corrections based on one or more factors involved in the processing of the wafer, and utilizing the predicted overlay offset corrections to positionally control the lithographic tool.

Lithography method and system with correction of overlay offset errors caused by wafer processing

A method of aligning a second layer to a first layer of a semiconductor structure by forming a first layer of a wafer having a distinguished feature via a first etching process that employs a first ionized gas generating machine. Forming a second layer having a circuit pattern via a second etching process that employs a second ionized gas generating machine, wherein the forming the second layer includes minimizing relative shifting between the distinguished feature located at an edge of the wafer for the first layer and the second circuit pattern located at the edge of the wafer for the second layer.

Method and device for minimizing multi-layer microscopic and macroscopic alignment errors

A method for forming an anti-reflective coating on a semiconductor substrate, including providing a first vessel containing an anti-reflective coating component and a second vessel containing a solvent. The anti-reflective coating component from the first vessel and the solvent from the second vessel are supplied to a mixing chamber. The anti-reflective coating component and the solvent are mixed in the mixing chamber to form a product. The product is transferred to the semiconductor substrate. The product is applied to the semiconductor substrate to form the anti-reflective coating. A system for forming an anti-reflective coating on a semiconductor substrate, including a first vessel for containing an anti-reflective coating component and a second vessel for containing a solvent. The system also includes a mixing chamber for mixing the anti-reflective coating component with the solvent to form a product, and a fluid transport system connecting the mixing chamber and the substrate for supplying the product from the mixing chamber to the semiconductor substrate to form the anti-reflective coating.

Anti-reflective coating conformality control

Growing community of inventors

Mechanicsville, VA, United States of America

William Roberts