USA as Represented by Secretary of the Navy

Baker Manufacturing Company, Inc.

William R Hunter

John F Seely

Neil C Lien

Jack C Rife

James Peter Long

Milton N Kabler

Richard T Williams

Johnny P Kirkland

A thin film reflecting interference filter (RIF) is designed to suppress unwanted harmonics thereby improving the monochromaticity of the radiation. An interference layer of material which has a well-defined plasma oscillation is deposited on a substrate and a mismatch layer is formed thereon. This interference layer exploits the interference between wavefronts reflected from the layer-substrate and the vacuum-layer interfaces to suppress higher order harmonics, while allowing good reflectance at the fundamental wavelength. This is achieved by positioning the RIF in the radiation at an angle of incidence which is greater than the critical angle of the desired fundamental wavelength, but less than critical angles of the harmonics to be suppressed. The mismatch layer increases the reflectance of the unwanted harmonics at the vacuum-layer interface, thus allowing more complete destructive interference of the unwanted harmonics. The RIF can be tuned by altering the thickness of the layer, the composition of the layer and/or the angle of incidence of the radiation.

Discrete vacuum ultra violet reflective interference filter

An interference photocathode includes a reflective substrate and interference layers disposed on said reflective substrate for selectively enhancing a first photoelectric yield of said photocathode when irradiated by radiation having a first wavelength relative to a second photoelectric yield of said photocathode when irradiated by radiation having a second wavelength. In one embodiment, the interference layers include a dielectric layer having a wavelength dependent effective thickness disposed on said reflective substrate such that said effective thickness for radiation having said first wavelength is an odd multiple of a quarter of said first wavelength and said effective thickness for radiation having said second wavelength is an even multiple of a quarter of said second wavelength. In another embodiment, the dielectric layer includes a layer of electrically conductive material and a dielectric material disposed between said layer of electrically conductive material and said reflective substrate.

Interference photocathode

A mirror for reflecting radiation at a desired wavelength in the soft x-ray region, comprises a substrate and a coating on the substrate. The coating contains a first section and a second section. The first section comprises at least one layer made up of at least a spacer sublayer and a nodal sublayer. The optical thickness of each spacer sublayer is selected so that, upon application of the radiation of desired wavelength, the mirror generates a standing wave having a node in the middle of each nodal sublayer. The second section is disposed between the first section and the substrate, and comprises a plurality of optically absorptive layers.

Low-damage multilayer mirror for the soft X-ray region

A scanning monochromator is disclosed which is capable of operation over a wide bandwidth in an ultra-high vacuum. The monochromator includes a pair of carousel assemblies carrying the optical elements which may be independently positioned translationally along the optical axis of the instrument and also rotationally, which each positioning control operable from outside of the instrument. A carousel on each of the carousel assemblies carries several optical elements and is rotatable to change which optical element is used, also from outside of the instrument.

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Springfield, VA, United States of America

William R Hunter