International Business Machines Corporation

William R Hill

Anthony K Stamper

Jeffrey P Gambino

Thomas L McDevitt

Arthur C Winslow

Robert Zwonik

Kenneth E McAvey, Jr

Michael A Gaynes

John Edward Cronin

William J Cote

Kenneth F McAvey, Jr

Cheryl A Hoffman

An integrated circuit and a method of manufacturing the integrated circuit, the method including: (a) providing a substrate; (b) forming a copper diffusion barrier layer on the substrate; (c) forming a dielectric layer on a top surface of the copper diffusion barrier layer; (d) forming a copper damascene or dual damascene wire in the dielectric layer, a top surface of the copper damascene or dual damascene wire coplanar with a top surface of the dielectric layer; (e) forming a first capping layer on the top surface of the wire and the top surface of the dielectric layer; (f) after step (e) performing one or more characterization procedures in relation to said integrated circuit; and (g) after step (e) forming a second capping layer on a top surface of the first capping layer.

Method of fabricating copper damascene and dual damascene interconnect wiring

A copper corrosion resistant integrated circuit. The integrated circuit including: a substrate; a copper diffusion barrier layer on the substrate; a dielectric layer on a top surface of the copper diffusion barrier layer; a copper damascene or dual damascene wire in the dielectric layer, a top surface of the copper damascene or dual damascene wire coplanar with a top surface of the dielectric layer; a first capping layer on the top surface of the wire and the top surface of the dielectric layer; and a second capping layer on a top surface of the first capping layer.

Copper damascene and dual damascene interconnect wiring

A method and resulting electronic package in which a heat sink is secured to the package's dielectric material (e.g., overmold). The surface of the dielectric is roughened (e.g., using an abrasive paper or pad) to enhance the subsequent dielectric-heat sink bond in which an adhesive is used. The dielectric material's roughened external surface(s), typically containing silicone material (e.g., silicone residue) which is an inherent by-product of many dielectric materials of the type used in such packaging, is (are) able to still be securely attached to the heat sink, despite the presence of said silicone. In another embodiment, the roughened surface enhances the marking of dielectric material of this type (e.g., using ink).

Method for bonding heat sinks to overmold material and resulting structure

Method for bonding heat sinks to overmold material

An apparatus and method for determining a selected endpoint in the polishing of layers on a workpiece in a chemical/mechanical polishing apparatus where the workpiece is rotated by a motor against a polishing pad. When a difficult to polish layer, i.e., one requiring a chemical change in a surface skin of the layer which skin is then abraded away by a mechanical process is removed from a more easy to polish surface, i.e., one that relies solely on mechanical abrasion and does not need to have a chemically converted skin thereon. The power required to maintain a set rotational speed in a motor rotating the workpiece significantly drops when the difficult to polish layer is removed. This current drop is used to detect the point at which the polishing must be stopped to avoid over polishing effects, i.e., dishing or thinning or removal of the more easily removed underlying material. Thus, an end point in the process can be established.

Endpoint detection apparatus and method for chemical/mechanical polishing

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Binghamton, NY, United States of America

William R Hill