Cymer, Inc.

Asml Netherlands B.v.

The Salk Institute for Biological Studies

Tcz Pte. Ltd.

Other

Advanced Pulse Power Technologies, Inc.

William N Partlo

Igor Vladimirovich Fomenkov

Richard L Sandstrom

Alexander Igorevich Ershov

Richard M Ness

Daniel J W Brown

Palash P Das

Richard C Ujazdowski

Eckehard D Onkels

Robert A Bergstedt

Daniel L Birx

Herve A Besaucele

Paul C Melcher

David Wayne Myers

Robert N Jacques

Stuart L Anderson

I Roger Oliver

Richard G Morton

Scott T Smith

Norbert R Bowering

Alexander Bykanov

Thomas Patrick Duffey

John Martin Algots

Toshihiko Ishihara

Daniel Anthony Rothweil

David S Knowles

William G Hulburd

German E Rylov

Tom A Watson

Xiaojiang Jason Pan

Oleh V Khodykin

Vladimir B Fleurov

Raymond F Cybulski

Curtis L Rettig

Brett D Smith

Peter Clarke Newman

Thomas D Steiger

Timothy S Dyer

Clodagh O'Shea

John A Rule

John P Fallon

Stephan T Melnychuk

Thomas Hofmann

Walter Dale Gillespie

Colin Powers

James K Howey

Jerzy R Hoffman

J Martin Algots

Alex P Ivaschenko

William G Oldham

Russell M Hudyma

Michael Thomas

Ivan Lalovic

Matthew Graham

Oscar Hemberg

John T Melchior

Jacob P Lipcon

Robert A Shannon

David C Brandt

Ronald L Spangler

Scot T Smith

Rodney D Simmons

Kai-Chung Hou

Jean-Marc Hueber

Georgiy Olegovich Vaschenko

R Kyle Webb

Donald G Larson

Robert G Ozarski

Steven Chang

Robert P Akins

Bryan George Moosman

Silvia De Dea

Fedor Trintchouk

Helmut Schillinger

Gamaralalage G Padmabandu

Claus Strowitzki

Shahryar Rokni

Paolo Zambon

Erik Roelof Loopstra

Vadim Yevgenyevich Banine

Uwe Stamm

Thomas A Yager

Paul S Thompson

Robert Jay Rafac

Tibor Juhasz

Gerardus Hubertus Petrus Maria Swinkels

Dzmitry Labetski

Steven Merrill Harrington

Anthony John De Ruyter

Janine K Kardokus

Vahan A Senekerimyan

Frederick G Erie

Rajasekhar Rao

Stanley Cruz Aguilar

Yoshiho Amada

Zsolt Bor

David W Myers

Robert L Morse

James A Carmichael

William F Marx

Tumor-selective recombinant adenoviruses that possess deletions or modifications in the E3 region are described. Recombinant adenoviruses that express adenovirus death protein (ADP) but have a deletion of at least three of the remaining six E3 genes exhibit enhanced virus replication. The recombinant adenoviruses further include additional modifications to allow selective replication in tumor cells and to detarget viruses from the liver. Use of the recombinant adenoviruses for cancer treatment is described.

Oncolytic adenovirus with enhanced replication properties comprising modifications in E1A, E3, and E4

Recombinant adenovirus genomes that include an exogenous open reading frame (ORF) and a self-cleaving peptide coding sequence are described. Optimal placement of the exogenous genes for minimal impact on viral kinetics is further disclosed. Therapeutic applications of the recombinant adenoviruses are also described.

Exogenous gene expression in recombinant adenovirus for minimal impact on viral kinetics

Recombinant adenovirus genomes that include a heterologous open reading frame (ORF) and a self-cleaving peptide coding sequence are described. The recombinant adenovirus genomes and recombinant adenoviruses produced by the disclosed genomes can be used, for example, in high-throughput assays to measure virus replication kinetics. Methods for measuring replication kinetics of a recombinant adenovirus are also described.

High throughput assay for measuring adenovirus replication kinetics

A device is disclosed herein which may comprise a droplet generator producing droplets of target material; a sensor providing an intercept time signal when a droplet reaches a preselected location; a delay circuit coupled with said sensor, the delay circuit generating a trigger signal delayed from the intercept time signal; a laser source responsive to a trigger signal to produce a laser pulse; and a system controlling said delay circuit to provide a trigger signal delayed from the intercept time by a first delay time to generate a light pulse that is focused on a droplet and a trigger signal delayed from the intercept time by a second delay time to generate a light pulse which is not focused on a droplet.

EUV light source with subsystem(s) for maintaining LPP drive laser output during EUV non-output periods

Exogenous gene expression in therapeutic adenovirus for minimal impact on viral kinetics

An extreme ultraviolet light system includes a steering system that steers and focuses an amplified light beam traveling along a propagation direction to a focal plane near a target location within an extreme ultraviolet light chamber, a detection system including at least one detector positioned to detect an image of a laser beam reflected from at least a portion of a target material within the chamber, a wavefront modification system in the path of the reflected laser beam and between the target location and the detection system, and a controller. The wavefront modification system is configured to modify the wavefront of the reflected laser beam as a function of a target focal plane position along the propagation direction. The controller includes logic for adjusting a location of the focal plane of the amplified light beam relative to the target material based on the detected image of the reflected laser beam.

Alignment of light source focus

A filter is used in a target material supply apparatus and includes a sheet having a first flat surface and a second opposing flat surface, and a plurality of through holes. The first flat surface is in fluid communication with a reservoir that holds a target mixture that includes a target material and non-target particles. The through holes extend from the second flat surface and are fluidly coupled at the second flat surface to an orifice of a nozzle. The sheet has a surface area that is exposed to the target mixture, the exposed surface area being at least a factor of one hundred less than an exposed surface area of a sintered filter having an equivalent transverse extent to that of the sheet.

Material supply apparatus for extreme ultraviolet light source having a filter constructed with a plurality of openings fluidly coupled to a plurality of through holes to remove non-target particles from the supply material

A pulsed gas discharge laser operating at an output laser pulse repetition rate of greater than 4 kHz and a method of operating same is disclosed which may comprise a high voltage electrode having a longitudinal extent; a main insulator electrically insulating the high voltage electrode from a grounded gas discharge chamber; a preionizer longitudinally extending along at least a portion of the longitudinal extent of the high voltage electrode; a preionization shim integral with the electrode extending toward the preionizer. The preionizer may be formed integrally with the main insulator. The preionization shim may substantially cover the gap between the electrode and the preionizer. The apparatus and method may comprise an aerodynamic fairing attached to the high voltage electrode to present an aerodynamically smooth surface to the gas flow.

High pulse repetition rate gas discharge laser

An extreme-ultraviolet (EUV) light source comprising an optic, a target material, and a laser beam passing through said optic along a beam path to irradiate said target material. The EUV light source further includes a system generating a gas flow directed toward said target material along said beam path, said system having a tapering member surrounding a volume and a plurality of gas lines, each gas line outputting a gas stream into said volume.

Systems and methods for buffer gas flow stabilization in a laser produced plasma light source

Corrosion resistant electrodes are formed of brass that has been doped with phosphorus. The electrodes are formed of brass that contains about 100 ppm to about 1,000 ppm of phosphorus, and the brass has no visible microporosity at a magnification of 400&#xd7;. The brass may be cartridge brass that contains about 30 weight percent of zinc and the balance copper. Corrosion resistant electrodes also may be formed by subjecting brass to severe plastic deformation to increase the resistance of the brass to plasma corrosion. The corrosion resistant electrodes can be used in laser systems to generate laser light.

Corrosion resistant electrodes for laser chambers

An extreme ultraviolet light system and method includes a drive laser, a chamber including an extreme ultraviolet light collector and a target material dispenser including an adjustable target material outlet capable of outputting multiple portions of target material along a target material path. Also included: a drive laser steering device, a detection system including at least one detector and a controller coupled to the target material dispenser, the detector system and the drive laser steering device. The controller includes logic for detecting a location of the first portion of target material from the first light reflected from the first portion of target material and logic for adjusting the target material dispenser outlet to output a subsequent portion of target material to a waist of the focused drive laser. A system and a method for optimizing an extreme ultraviolet light output is also disclosed.

System, method and apparatus for aligning and synchronizing target material for optimum extreme ultraviolet light output

An EUV lithographic apparatus includes a source collector apparatus in which the extreme ultraviolet radiation is generated by exciting a fuel to provide a plasma emitting the radiation. The source collector apparatus includes a chamber in fluid communication with a guide way external to the chamber. A pump for circulating buffer gas is part of the guide way, and provides a closed loop buffer gas flow. The gas flowing through the guide way traverses a gas decomposer wherein a compound of fuel material and buffer gas material is decomposed, so that decomposed buffer gas material can be fed back into the closed loop flow path.

Source collector, lithographic apparatus and device manufacturing method

Devices are described herein which may comprise an optic having a non-planar surface, the non-planar surface having an optically active portion; and a flow guide directing gas upon the non-planar surface to produce turbulent flow on at least a portion of the optically active portion of the non-planar surface to cool the optic.

Systems and methods for cooling an optic

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Poway, CA, United States of America

William N Partlo