Kla Tencor Corporation

Other

Kla Corporation

William G Schultz

Gildardo Rios Delgado

Garry Allen Rose

Rudy Flores Garcia

Frances Hill

Edgardo Garcia Berrios

Roland P Schultz

An electron beam system and method are provided. The system includes a detector having a detector face configured to detect back-scattered electrons reflected off of a sample. The system further includes an annular cap disposed on the detector face, and a protective pellicle disposed on the annular cap, covering the detector face. The protective pellicle is transparent to back-scattered electrons and provides a physical barrier to particles directed at the detector face.

Thin pellicle material for protection of solid-state electron detectors

An electron extractor of an electron source capable of absorbing contaminant materials from a cavity proximate to the extractor is disclosed. The electron extractor includes a body. The body of the electron extractor is formed from one or more non-evaporable getter materials. The one or more non-evaporable getter materials absorb one or more contaminants contained within a region proximate to the body of the electron extractor. The body of the electron extractor is further configured to extract electrons from one or more emitters posited proximate to the body of the electron extractor.

System and method for providing a clean environment in an electron-optical system

An emitter containing a metal boride material has an at least partly rounded tip with a radius of 1 &#x3bc;m or less. An electric field can be applied to the emitter and an electron beam is generated from the emitter. To form the emitter, material is removed from a single crystal rod to form an emitter containing a metal boride material having a rounded tip with a radius of 1 &#x3bc;m or less.

High brightness boron-containing electron beam emitters for use in a vacuum environment

A system for imaging a sample through a protective pellicle is disclosed. The system includes an electron beam source configured to generate an electron beam and a sample stage configured to secure a sample and a pellicle, wherein the pellicle is disposed above the sample. The system also includes an electron-optical column including a set of electron-optical elements to direct at least a portion of the electron beam through the pellicle and onto a portion of the sample. In addition, the system includes a detector assembly positioned above the pellicle and configured to detect electrons emanating from the surface of the sample.

Method and system for imaging of a photomask through a pellicle

There is disclosed an elbow cover formed of a flexible thin sheet having a bistable configuration with: (1) an open stacking shape having an interior concavity and exterior convexity formed with a substantially ellipsoidal central portion and opposite, laterally projecting, substantially parabolic hyperboloidal ears; and (2) a closed, stable configuration forming a tubular elbow shape with the ears folded inwardly, completing the tubular ends of the elbow shape. The elbow cover is characterized by an unstable configuration assumed by compression of the closed tubular shape between its opposite outside tubular edges whereby the elbow shape flexes and spreads open, laterally separating the ears in a position permitting a one-handed application of the cover to an insulated elbow joint of tubular conduits.

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San Jose, CA, United States of America

William G Schultz