Aplex, Inc.

Apple Inc.

Acurex Corporation

William F Lapson

David E Weldon

Shu-Hsin Kao

Robert M Kendall

Garry K Kwong

Peter Mok

Shou-sung Chang

Huey M Tzeng

Gregory A Appel

William D Atkinson

Gregory C Lee

Charles J Regan

Harry Lee

Greg Simon

A polishing tool uses a seal cavity containing a fluid that supports polishing pads against an object being polished. The boundaries of the cavity include a support structure, a portion of a polishing material, and a seal between the support structure and the polishing material. The polishing material moves relative to the support structure and seal. A variety of seal configurations can maintain the fluid within the cavity. In one embodiment the seal mechanism is a labyrinth seal including multiple ridges. In one embodiment, the seal mechanism is a face-sealing seal which includes a jacket with a u-shaped cross section with a compressible element positioned within it. The face-sealing seal is in a groove positioned outside of the cavity. Alternatively, the face-sealing seal forms the outer edge of the cavity. In a further embodiment, the seal is an o-ring seal positioned within a double dove-tailed groove.

Seal for polishing belt center support having a single movable sealed

Heat is transferred between a linear CMP belt and an adjacent heat transfer source, providing a predetermined lateral temperature distribution across the belt. Temperature sensors generate feedback signals to control the heat transfer sources. Alternatively, process monitoring sensors provide feedback signals. The heat transfer source can include multiple selectively controllable individual heat transfer sources having differing temperatures, which can be above or below ambient temperature. The mechanism of heat transfer can include one or more of convection, conduction, and radiation. The configuration provides substantial flexibility to establish and maintain selective non-uniform temperature distributions across the polishing belt. This in turn permits precise control and stability of the polishing process. Heat transfer sources can include pulleys, slurry dispensers, polishing pad conditioners or conditioner back supports, fluid nozzles, and sealed fluid cavity belt supports.

Temperature regulation in a CMP process

A cursor control device having particular application to a computer display system is disclosed. The cursor control includes a unitary frame, having a domed portion substantially surrounding and retaining a ball which is free to rotate. X-Y position indicating means are provided, such that rotation of the ball provides signals indicative of X-Y positions on the display system. The ball is free to 'float' in the vertical direction within the dome, and thereby maintain good surface contact. X-Y positions are established by movement of the control device over a surface. A display system and method is disclosed for use in conjunction with the cursor control device, which permits a user to select command options simply by movement of the displayed cursor over a 'pull-down' menu bar.

Cursor control device for use with display systems

An inspection apparatus scans the object being sorted and produces a reject signal for rejecting an unwanted object. In the sorting of produce culls (spoiled green or overripe produce) are rejected. The rejector system employs a piston-driven rejector for removing the culls or unwanted object. An air cylinder provides air under pressure to drive the piston. A valve selectively applies from the cylinder in response to the reject signals. A flow restrictor is placed in the air supply line for controlling the acceleration and velocity of the air-driven piston.

Rejector drive system for sorting apparatus

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Cupertino, CA, United States of America

William F Lapson