Borgwarner Inc.

William D Sproul

Kostas F Dockus

James R Tomashek

Roger K Nibert

A kit and process are provided for working metals, said kit comprising a metal nitride and/or metal carbonitride coated metal working tool and a water soluble metal working fluid, said fluid including a relatively large alkoxylated amine, an alkanol amine and an acid-derived compound selected from the group consisting of organic acids, inorganic acids, and salts thereof, and said process comprising contacting a metal workpiece with said metal working tool and said fluid to effectuate working of said metal.

Process and kit for working metals

A high hardness hafnium nitride formed by a reactive sputter coating of a substrate in a closed chamber with a substantially pure hafnium target, and an atmosphere of argon and nitrogen. The hafnium nitride has a face centered cubic structure with a lattice spacing of 4.55 to 4.58 .ANG., and a hardness in the range of 2700 to 5500 kilograms per square millimeter utilizing a Vickers microindentation hardness test.

High hardness hafnium nitride

A metal from group IVb of the periodic table is used as the target in a reactive deposition process. An inert gas such as argon is admitted within the chamber housing the target. Electrical power at a constant level is supplied to the target, ionizing the inert gas so that the ions bombard the metal target and initiate sputtering. A controlled flow of a reactive gas such as nitrogen is then admitted to the chamber and controlled in such a way that the metal deposition rate is not lowered. The amount of the reactive gas is constantly sampled to provide a control signal used to regulate admission of the reactive gas at the proper rate for most effective deposition of the metal onto the substrate. Closed loop systems regulate the level of electrical power supplied to the target, rate of admission of the inert gas, and rate of admission of the reactive gas.

Rapid rate reactive sputtering of a group IVb metal

A method of reactive sputtering of the nitride, oxide or carbide of titanium or similar materials onto a substrate from a target of the pure metal in a chamber utilizing an inert gas, such as argon, wherein the deposition rate of the metallic compound approaches substantially the deposition rate of the pure metal. A reactive gas is introduced into the chamber adjacent to the target at a constant flow and by a rapid pulsing wherein a valve is alternately opened and shut for very short time intervals.

Rapid rate reactive sputtering of metallic compounds

The surfaces of aluminum and aluminum alloy articles, when abraded with a low-density abrasive product in the presence of a lower alcohol such as isopropanol, are readily plated or coated to provide a uniform plating or coating. The process is particularly useful in providing aluminum-silicon brazing alloy with nickel or nickel-lead plating for brazing.

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Palatine, IL, United States of America

William D Sproul