Eastman-kodak Company

William C McColgin

Laurel J Pace

Michel Frantz Molaire

Thomas B Brust

Joseph Jech, Jr

Michael Scozzafava

Robert C Daly

Robert D Lindholm

This invention relates to a method for fabricating a color solid-state image sensor which comprises, the steps of: forming an inorganic passivation layer over an array of photosensing elements and their associate bonding patterns; providing a color filter array over the passivation layer; forming a photoresist layer over the color filter array and other exposed areas; forming a pattern in the photoresist such that portions over the bonding pad areas are opened; and removing selective regions of the passivation layer to expose the bonding pads.

Method for making contact openings in color image sensor passivation

A lift-off process for forming patterned films of particular use for films of metals that need to be deposited in a non-directional fashion. The process features a lift-off mask that includes a thin coating of Brewer Science ARC.RTM. PN-2 as an assisting layer under a photoresist layer.

Lift-off process

A method for producing high resolution patterned resist images having excellent etch resistance and superior thermal and dimensional stability comprises the steps of:

Bilayer lithographic process

A photographic method for making a color filter element, and the resulting color filter element is disclosed.

Color filter elements and electrophotographic method of making same

A device is disclosed comprising a non-planar semiconductor substrate and a planarizing layer thereon, the planarizing layer having a maximum thickness that is no greater than about 3.mu. and a planarization factor P.gtoreq.1.0. In a preferred embodiment, the layer comprises a polymer formed from a liquid monomer coated onto the substrate and thereafter polymerized.

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Pittsford, NY, United States of America

William C McColgin