Ppg Industries Ohio, Inc.

Ppg Industries, Inc.

Hewlett-packard Company

Basf Corporation

William C Allison

Alan E Wang

Louis J Nehmsmann

Robert G Swisher

Suk H Cho

Robert H Tang

Suryya K Das

Soner Kilic

Charles T Hill

Lorna Alderfer

The present invention relates to an article for altering a surface of a workpiece, or a polishing pad having a window. In particular, the polishing pad includes a polyurethane urea material wherein the polyurethane urea material contains cells which are at least partially filled with gas. The polyurethane urea material can be prepared by combining polyisocyanate and/or polyurethane prepolymer, hydroxyl-containing material, amine-containing material and blowing agent. The polishing pad according to the present invention is useful for polishing articles, and is especially useful for chemical mechanical polishing or planarization of microelectronic and optical electronic devices such as but not limited to semiconductor wafers. The window of the polishing pad is at least partially transparent and thus, can be particularly useful with polishing or planarizing tools that are equipped with through-the-platen wafer metrology.

Polyurethane urea polishing pad

A polishing pad is described as comprising, (a) particulate polymer which can be chosen from particulate thermoplastic polymer (e.g., particulate thermoplastic polyurethane), particulate crosslinked polymer (e.g., particulate crosslinked polyurethane and/or particulate crosslinked polyepoxide) and mixtures thereof; and (b) organic polymer binder (e.g., polyurethane binder and/or polyepoxide binder), which can bind the particulate polymer together, wherein said organic polymer binder can be prepared in-situ. The particulate polymer and organic polymer binder can be distributed substantially across the work surface the polishing pad, and the pad can have a percent pore volume of from 2 percent by volume to 50 percent by volume, based on the total volume of said polishing pad.

Polishing pad

The present invention relates to a polishing pad. In particular, the polishing pad of the present invention comprises a sublayer, a middle layer, and a top layer which can function as a polishing layer. The polishing pad of the present invention is useful for polishing articles and particularly useful for chemical mechanical polishing or planarization of a microelectronic device, such as a semiconductor wafer.

Polishing pad for planarization

A printing medium comprising a substrate having at least one surface and a coating on the surface wherein the coating comprises: (a) binder comprising: (1) organic polymer which is substantially free of ammonium groups, (2) first cationic addition polymer consisting essentially of quaternary ammonium-containing mer units derived from addition monomer and ammonium-free mer units derived from addition monomer, and (3) second cationic addition polymer consisting essentially of secondary, tertiary, or both secondary and tertiary ammonium-containing mer units derived from addition monomer and ammonium-free mer units derived from addition monomer, wherein the binder constitutes from 20 to 90 percent by weight of the coating; and (b) finely divided substantially water-insoluble filler particles which have a maximum dimension of less than 500 nanometers, are distributed throughout the binder, and constitute from 10 to 80 percent by weight of coating.

Inkjet printing media

Described are novel synthetic detergent base materials having a pH from 5 to 8 and consisting essentially of from 45 to 70 weight percent of mild synthetic surfactant, salts thereof, or a mixture of the mild synthetic surfactant and salts thereof; from 20 to 30 weight percent of C,-C,fatty acid; from 1.5 to 10 weight percent of C,-C,n-acyl sarcosine, salts thereof, or a mixture of the sarcosine and salts thereof; from 0.5 to 5 weight percent of C,-C,alkyl aryl sulfonic acid, salts thereof, or a mixture of the sulfonic acid and salts thereof; and from 1 to 5 weight percent soap, e.g., salts of C,-C,fatty acid. Also described are syndet bars prepared from the synthetic detergent base material.

Synthetic detergent base material and synthetic detergent bar produced therefrom

An amphoteric, hair fixative polymer for use in hair sprays, gels, and the like contains 40-90 percent of a hydroxyl-containing ethylenically unsaturated monomer, 1-20 percent of an acid-containing ethylenically unsaturated monomer, and 1-20 percent of an amine-containing ethylenically unsaturated monomer. The polymer has hydroxyl, acid and amine functionalities and, while being insoluble in water, can be solubilized in water by the use of amine neutralizers, acidic neutralizers, or by solubilizing in alcohol-water mixtures. The polymers provide hair fixatives that are fast drying, and have excellent curl retention with low curl droop.

Hair fixative amphoteric polymer composition

A printing medium comprising a substrate having at least one surface and a coating on the surface wherein the coating comprises: (a) binder comprising: (1) organic polymer which is substantially free of onium groups, and (2) onium addition polymer consisting essentially of onium-containing mer units derived from addition monomer and onium-free mer units derived from addition monomer of which from 20 to 100 percent by weight is hydrophobic addition monomer, wherein the binder constitutes from 20 to 90 percent by weight of the coating; and (b) finely divided substantially water-insoluble pseudoboehmite particles which have a maximum dimension of less than 500 nanometers, are distributed throughout the binder, and constitute from 10 to 80 percent by weight of the coating.

Described are detergent compositions that exhibit reduced skin irritation properties while providing excellent cleaning and detergent characteristics. The detergent composition contains anionic and/or nonionic surface active materials that are at least mildly irritating to the skin and an amount of alkyl poly(ethyleneoxy)sulfonate sufficient to reduce the primary skin irritation potential of the detergent composition. The aliphatic poly(ethyleneoxy)sulfonate typically has a hydrophobe containing from 12 to about 22 carbon atoms and an average of from about 10 to about 30 ethyleneoxy groups, and is present in the detergent composition in amounts of from about 5 to about 50 percent of the total amount of surface active material in the detergent composition.

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Murrysville, PA, United States of America

William C Allison