Carl-zeiss-stiftung

Carl-zeiss-smt Ag

Carl Zeiss Semiconductor Manufacturing Technologies Ag

Willi Ulrich

Bernd Kleemann

Peter Reimer

Helmut Beierl

Theo Lasser

Herbert Gross

Hans-Jurgen Rostalski

Hans-J&uuml;rgen Rostalski

Walter Wrobel

A diffractive optical element has a plurality of diffraction structures for a certain wavelength. These each have a width measured in the plane of the diffractive optical element and a height measured perpendicularly thereto. The widths and the heights of the diffraction structures vary over the area of the diffractive optical element. An optical arrangement comprising such a diffractive optical element has, in addition, a neutral filter. The efficiency of such a diffractive optical element and of such an arrangement can be optimized locally for usable light.

Diffractive optical element and also optical arrangement comprising a diffractive optical element

A catadioptric projection objective comprises an object plane, a physical beam splitter, a concave mirror, an image plane, a first objective part, a second objective part, and a third objective part. The first objective part is located between the object plane and the physical beam splitter. The second objective part is located between the physical beam splitter and the concave mirror, and includes at least two divergent lenses. The third objective part is located between the physical beam splitter and the image plane.

Catadioptric objective with physical beam splitter

For defined ablation of a surface, successive partial regions of equal surface area are acted on by a radiation source, preferably a laser, through an optical system. The partial regions are smaller as regards surface area than the whole surface to be processed, so that the respective radiation source can be dimensioned in a less costly manner. Telescope optics with conical surfaces serve as optical systems suitable for this purpose.

Process and apparatus for the ablation of a surface

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Aalen, Germany

Willi Ulrich