Asml Netherlands B.v.

Willem Jan Bouman

Johannes Jacobus Matheus Baselmans

Theodorus Marinus Modderman

Cornelius Maria Rops

Koen Steffens

Ronald Van Der Ham

Theodorus Wilhelmus Polet

Bart Smeets

Duan-Fu Stephen Hsu

Heine Melle Mulder

Paul Van Der Veen

Han Henricus Aldegonda Lempens

Gerben Pieterse

Bert Claessens

Wilfred Edward Endendijk

Marie-Claire Van Lare

Bert Pieter Van Drieënhuizen

Jozef Ferdinand Dymphna Verbeeck

Frank Jan Timmermans

Marc Hendricus Margaretha Dassen

Thijs Johan Henry Hollink

Apparatuses and techniques for suppressing a zeroth order portion of a configured radiation beam. In some embodiments, an extreme ultraviolet (EUV) lithographic apparatus for forming an image on a substrate by use of an EUV radiation beam that is configured by a patterning device comprising a pattern of reflective regions and partially reflective regions, wherein the partially reflective regions are configured to suppress and apply a phase shift to a portion of the EUV radiation beam, may include a projection system. The projection system may be configured to suppress a zeroth order portion of a configured EUV radiation beam, and direct an unsuppressed portion of a configured EUV radiation beam towards a substrate to form an image on the substrate.

Imaging via zeroth order suppression

An immersion lithographic apparatus including: a liquid confinement structure configured to supply and confine immersion liquid to an immersion space between a final lens element of a projection system and a surface of the substrate and/or of a substrate table; and a passageway-former between the projection system and the liquid confinement structure, and a passageway between the passageway-former and an optically active part of the final lens element, the passageway being in liquid communication via an opening with the immersion space and extending radially outwardly, with respect to an optical axis of the projection system, at least to an edge of an exposed bottom surface of the final lens element and being constructed and configured such that in use it is filled with liquid from the immersion space by capillary action.

Lithographic apparatus and a method of manufacturing a lithographic apparatus

An immersion lithographic apparatus includes a projection system. The projection system is configured to project a patterned radiation beam through an immersion liquid onto a target portion of a substrate. An external surface of the projection system includes a first surface. The first surface has a non-planar shape. An element is attached to the first surface and positioned so that at least a portion of the element contacts the immersion liquid in use. The element includes a closed loop of continuously integral material in a preformed state and conforms to the non-planar shape of the first surface.

Immersion lithographic apparatus and device manufacturing method

An illumination system having an array of individually controllable optical elements is disclosed, wherein each element is moveable between a plurality of orientations which may be selected in order to form desired illumination modes. The illumination system includes a controller to control orientation of one or more of the elements, the controller configured to apply force to the one or more elements which at least partially compensates for force applied to the one or more elements by a burst of radiation incident upon the one or more elements.

Illumination system and lithographic apparatus

A uniformity controller is arranged to control a profile of a radiation intensity along the length of a target portion of a substrate so as to substantially compensate for irradiation-induced variation of the profile with respect to time. The uniformity controller includes a variable filter interposed between the illumination system and the target portion and arranged to control the relative values of the intensity applied at a series of positions within the target portion of the substrate so as to substantially compensate for variation of the profile with respect to time. In this manner the radiation intensity is controlled at a series of positions within the target portion so as to compensate for variation of the intensity profile with time.

Lithographic apparatus and device manufacturing method

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Moergestel, Netherlands

Willem Jan Bouman