Lam Research Corporation

Lam Researh Corporation

Willem Cornelis Lambert Hopman

Jan Matthijn Dekkers

Jeroen Aaldert Heuver

Kristiaan Hendrikus Aloysius Böhm

Jan Arnaud Janssens

Kurt Hein Vergeer

The invention relates to a method for controlling stress in a substrate during laser deposition. The method includes the steps of: providing a laser deposition device including a chamber with a target holder with a target, a substrate holder with a substrate facing the target and a window, the laser deposition device further including a laser beam directed through the window of the chamber onto a spot at the target for generating a plasma plume of target material and depositing the target material onto a surface portion of the substrate in order to form a thin film of target material, wherein the target spot is movable relative to the substrate in order to deposit target material onto a plurality of surface portions of the substrate; defining a plurality of discrete surface portions on the substrate; aligning the target spot one after the other with each of the plurality of discrete surface portions and generating a plasma plume to deposit target material on each of the plurality of discrete surface portions; and adjusting at least one of the parameters of the deposition process depending on the discrete surface portion with which the target spot is aligned, which parameters include temperature, pressure, laser beam pulse duration, laser beam power, distance of target to substrate.

Method for controlling stress in a substrate during laser deposition

A filter for a pulsed laser deposition device includes a housing with two pass-through openings arranged in the housing wall and forming a pass-through channel for passing at least part of the plasma plume through the housing, which pass-through channel extends from one side of the housing to an opposite side of the housing, at least one primary blade arranged at a distance from and rotatable around a rotation axis, with the path of the at least one primary blade intersecting with the pass-through channel and with the at least one primary blade having a contact surface for contact with the plasma plume, and a drain channel connecting to a drain opening arranged in the housing wall.

Filter for a plasma plume

The invention relates to a method for producing a scandium aluminum nitride (ScAlN) target body for pulsed laser deposition (PLD), which includes the steps of: providing a scandium aluminum alloy body; pulverizing the scandium aluminum alloy body into scandium aluminum particles; nitridizing the scandium aluminum particles into scandium aluminium nitride particles; and hot pressing the scandium aluminum nitride particles into a scandium aluminum nitride target body.

Method for manufacturing ScAIN target

The invention relates to a device for pulsed laser deposition and a substrate with a substrate surface, which device includes: a substrate holder for holding the substrate; a target arranged facing the substrate surface of the substrate; a velocity filter arranged between the substrate and the target; a pulsed laser directed onto the target at a target spot for generating a plasma plume of target material; and a plasma hole plate arranged between the target and the substrate. The plasma hole plate has a plasma passage opening divided in an upstream section and a downstream section by a dividing plane. The target spot coincides with the dividing plane, and the surface area of the upstream section is larger than the surface area of the downstream section.

Device for pulsed laser deposition and a substrate with a substrate surface for reduction of particles on the substrate

The invention relates to a filter for filtering particles from a plasma plume. The filter includes a housing with two pass-through openings arranged in the housing wall and forming a pass-through channel for passing at least part of the plasma plume through the housing, which pass-through channel extends from one side of the housing to an opposite side of the housing, at least one primary blade arranged at a distance from and rotatable around a rotation axis, which rotation axis is parallel and spaced apart from the center line of the pass-through channel, with the path of the at least one primary blade intersecting with the pass-through channel and with the at least one primary blade having a contact surface for contact with the plasma plume, which contact surface is facing in the direction of the rotation direction, and a drain channel connecting to a drain opening arranged in the housing wall. A line extending perpendicular from both the center line of the pass-through channel and a radial line extending from the rotation axis through the center line of the pass-through channel and through the path of the at least one primary blade, extends through the drain opening.

Growing community of inventors

Deventer, Netherlands

Willem Cornelis Lambert Hopman