Asml Netherlands B.v.

Koninklijke Philips Corporation N.v.

Wilhelmus Josephus Box

Bernardus Antonius Johannes Luttikhuis

Erik Roelof Loopstra

Dominicus Jacobus Petrus Adrianus Franken

Levinus Pieter Bakker

Marc Wilhelmus Maria Van Der Wijst

Frank Jeroen Pieter Schuurmans

Petrus Rutgerus Bartray

Engelbertus Antonius Fransiscus Van Der Pasch

Marcel Mathijs Theodore Marie Dierichs

Ruud Antonius Catharina Maria Beerens

Jakob Vijfvinkel

Peter Paul Steijaert

Johannes Maria Freriks

Albertus Adrianus Smits

Martinus Hendrikus Antonius Leenders

Joost Jeroen Ottens

Johannes Henricus Wilhelmus Jacobs

Antonius Johannes Josephus Van Dijsseldonk

Pertrus Rutgerus Bartray

Thijs Harink

Engelbertus Antonius Franciscus Van Der Pasch

Michael Ten Bhomer

Emiel Jozef Eussen

Marc Johannes Martinus Engels

Maarten Marinus Johannes Wilhelmus Van Herpen

Marco Koert Stavenga

Timotheus Franciscus Sengers

Derk Jan Wilfred Klunder

Marcel Beckers

Hernes Jacobs

Tjarko Adriaan Rudolf Van Empel

Paulus Martinus Maria Liebregts

Kars Zeger Troost

Emiel Jozef Melanie Eussen

Leon Martin Levasier

Hendrik Jan Eggink

Noud Jan Gilissen

Jan Evert Van Der Werf

Olav Waldemar Vladimir Frijns

Ferdy Migchelbrink

Hendrikus Gijsbertus Schimmel

Jan Jaap Kuit

Jacek Lukasz Kustra

Carlo Cornelis Maria Luijten

Antonius Maria Rijken

Marcel Johannus Elisabeth Hubertus Muitjens

Lambertus Gerardus Maria Kessels

Harm-Jan Voorma

Henricus Gerardus Tegenbosch

Marius Ravensbergen

Wilhelmus Andreas Marinus Arnoldus Maria Van Den Dungen

Aaldert Jan Elevelt

Josephus Jacobus Smits

Martinus Arnoldus Henricus Terken

Jan Van Elp

Robert Gordon Livesey

Stephen Ledingham

Rob Jansen

Tomas Russ

Martinus Hendricus Hendricus Hoeks

Nicolaas Antonius Allegondus Johannes Van Asten

Leon Joseph Marie Van Den Schoor

Jacobus Sigbertus Marie Geraats

Niels Machiel Driessen

Luberthus Ouwehand

Elke Van Loenhout

Maurice Piërre Marie Arthur Limpens

Mustafa Amhaouch

Franciscus Catharina Bernardus Marinus Van Vroonhoven

Saskia Maria Camps

Antonius Leonardus Johannes Van Noort

Arno Jano Bleeker

Thomas Henricus Jacobus Verhagen

Josephus Jakobus Smits

An ultrasound probe positioning system () comprises a positioning unit () for holding an ultrasound probe unit () and for moving the ultrasound probe unit and positioning it at a target position and a positioning control unit () configured to provide target positioning data indicative of a target position that establishes a mechanical contact of the ultrasound probe unit with an external object () and to control the mechanical positioning unit in moving and positioning the ultrasound probe at the target position. The positioning unit comprises a force actuation unit () configured to adapt a pressing force amount of a mechanical pressing force exerted on the object in response to a variation of a counterforce amount so as to maintain a predetermined net pressing force amount exerted by the mechanical pressing force against the counterforce.

Ultrasound probe positioning system and method of hands-free controlling the pressure applied by an ultrasound probe to an external object

A geo-fencing system () includes a base device () configured to create a virtual fence () around the base devise that bounds a safe zone (). The geo-fencing system further includes a wearable device () initially located within the safe zone. The geo-fencing system further includes a processor configured to execute a dynamic adaptive control algorithm that computes at least one operating parameter for at least one of the base device and the wearable device based on a dynamic and adaptive combination of different signals indicative of distance measurements between the wearable device and the base device computed by the at least one of the base device and the wearable device. The processor conveys the at least one operating parameter to the at least one of the base device and the wearable device, which employs the at least one operating parameter for operation and determination of subsequent distance measurements.

Geo-fencing based on multiple signals and configuration

A lithographic apparatus includes an illumination system to provide a beam of radiation, a support to support a patterning devices, the patterning devices configured to impart the beam with a pattern in its cross-section, a substrate table to hold a substrate, a projection system to project the patterned beam onto a target portion of the substrate, and a conditioning system to condition the substrate. The conditioning system conditions a non-target portion of the substrate with a conditioning fluid. A method of manufacturing a device includes conditioning a non-target portion of a substrate.

Lithographic apparatus and device manufacturing method

A lithographic apparatus is disclosed that includes an encoder type sensor system configured to measure a position of a substrate table of the lithographic apparatus relative to a reference structure. The encoder type sensor system includes an encoder sensor head and an encoder sensor target and the lithographic apparatus comprises a recess to accommodate the encoder sensor target.

Lithographic apparatus having an encoder type position sensor system

Lithographic apparatus having encoder type position sensor system

Lithographic apparatus having an encoder position sensor system

A radiation system includes a contamination barrier configured to permit radiation from a radiation source to pass through and to capture debris coming from the radiation source. The contamination barrier includes a plurality of lamellas. The surface of the lamellas includes a material. The radiation system also includes a collector configured to collect radiation from the contamination barrier. An optical surface of the collector includes a material that is the same as the material of the surface of the lamellas.

Radiation system with contamination barrier

Methods of manufacturing an integrated circuit by a lithographic apparatus are disclosed. The methods include patterning a radiation beam with a patterning device, projecting the patterned beam onto a substrate using a projection system, and determining the position of the patterning device. In one example, the patterning device's position relative to the projection system is determined by measuring the position of the patterning device's support structure. In another example, the position can be determined by measuring a position of the patterning device relative to its support and by measuring a position of the support. In another example, a Z-position of the patterning device is determined by directing at least one beam of radiation onto a part of the patterning device located outside a pattern area. This can be done by directing a pair of laser beams from sensors on the projection system to reflecting strips on the patterning device.

Integrated circuit manufacturing methods with patterning device position determination

A contamination barrier configured to permit radiation from a radiation source to pass through and to capture debris from the radiation source. The contamination barrier includes a support structure, a plurality of plate members arranged on the support structure and extending in a radial direction from an axis of the support structure, and a shield configured to block at least part of the support structure from being hit by radiation or debris from the radiation source.

Contamination barrier with expandable lamellas

A device manufacturing method is disclosed. The method includes patterning a beam of radiation, projecting the patterned beam of radiation onto a plurality of outer target portions of a substrate in a sequence in which each subsequent outer target portion is spaced-apart from a preceding outer target portion, and subsequent to projecting the patterned beam of radiation on the plurality of outer target portions, projecting the patterned beam of radiation onto an inner target portion of the substrate.

Device manufacturing method, lithographic apparatus and device manufactured thereby

A lithographic apparatus having an illumination system configured to provide a radiation beam; a support structure configured to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section, thus providing a patterned radiation beam; a substrate table configured to hold a substrate; a projection system arranged to project the patterned radiation beam onto a target portion of the substrate, and a projection system support configured to support the projection system on a reference frame. The lithographic apparatus further includes a thermal conditioning system configured to thermally condition the projection system support. The invention further relates to a thermal conditioning system constructed and arranged to thermally condition a projection system support. The invention further relates to a device manufacturing method and a method for manufacturing a device.

Lithographic apparatus, thermal conditioning system, and method for manufacturing a device

A lithographic apparatus is disclosed. The apparatus includes a substrate table constructed to hold a substrate. The substrate table is moveable to transfer the substrate between a substrate measuring position and a substrate processing position. The apparatus also includes a measuring system configured to measure at least one aspect or characteristic of the substrate when the substrate table holds the substrate in the measuring position. The measuring system is configured to direct at least one measuring beam and/or field towards a surface of the substrate. A projection system is configured to project a patterned radiation beam onto a target portion of the substrate when the substrate table holds the substrate in the substrate processing position, and a conditioning system is configured to supply a conditioning fluid to at least part of a path of the measuring beam and/or field of the measuring system to condition the part of the path.

Lithographic apparatus and method for manufacturing a device

A lithographic apparatus comprises a substrate table that supports a substrate and a substrate handler that moves the substrate relative to the substrate table. The substrate handler is adapted to load substrates on to and unload substrates from the substrate table before and after exposure. Also, a clean gas supply system supplies a clean gas to at least one location at which the substrate is located. The clean gas supply system is moveably mounted. A device manufacturing method utilizing the lithographic apparatus can be used to manufacture at least one of a flat panel display and an integrated circuit device.

Lithographic apparatus and device manufacturing method utilizing movement of clean air to reduce contamination

A lithographic apparatus includes an illumination system for projecting a beam of radiation onto a substrate. The lithographic apparatus further has a chuck assembly for supporting at least one of the substrate or a patterning device, the patterning device serving to impart the beam with a pattern in its cross-section. A heat transfer system is operable between a first surface and a second surface. The heat transfer system is capable of transferring heat between the first surface and the second surface. The first surface is at least partially formed by at least a part of the chuck assembly. The second surface is at least partially formed by at least a part of a component spaced a distance from the chuck. The second surface is mechanically isolated from and thermally coupled to the first surface.

Growing community of inventors

Eksel, Belgium

Wilhelmus Josephus Box