Asml Netherlands B.v.

Wilhelmus Franciscus Johannes Simons

Koen Steffens

Ronald Van Der Ham

Han Henricus Aldegonda Lempens

Paulus Martinus Maria Liebregts

Paul Petrus Joannes Berkvens

Gert-Jan Gerardus Johannes Thomas Brands

Franciscus Johannes Joseph Janssen

Theodorus Wilhelmus Polet

Marcio Alexandre Cano Miranda

Patrick Johannes Wilhelmus Spruytenburg

Christophe De Metsenaere

Joris Johan Anne-Marie Verstraete

Hans Butler

Johannes Henricus Wilhelmus Jacobs

Henrikus Herman Marie Cox

Ruud Hendrikus Martinus Johannes Bloks

Daniel Jozef Maria Direcks

Mathieus Anna Karel Van Lierop

Christiaan Alexander Hoogendam

Michel Riepen

Raymond Wilhelmus Louis Lafarre

Thibault Simon Mathieu Laurent

Martijn Houben

Rogier Hendrikus Magdalena Cortie

Siegfried Alexander Tromp

Jim Vincent Overkamp

Gerben Pieterse

Marcel François Heertjes

Eva Mondt

Daniël Jozef Maria Direcks

Van Vuong Vy

Erik Roelof Loopstra

Frank Johannes Jacobus Van Boxtel

Jimmy Matheus Wilhelmus Van De Winkel

Gregory Martin Mason Corcoran

Dennis Andreas Petrus Hubertina Houben

Jeffrey Hendrikus Peter Maria Goossens

Bob Streefkerk

Jeroen Johannes Sophia Maria Mertens

Martinus Hendrikus Antonius Leenders

Joost Jeroen Ottens

Nicolaas Rudolf Kemper

Jan-Gerard Cornelis Van Der Toorn

Roelof Frederik De Graaf

Frits Van Der Meulen

Jan Bernard Plechelmus Van Schoot

Theodorus Petrus Maria Cadee

Sven Antoin Johan Hol

Frederik Eduard De Jong

Maurice Willem Jozef Etiënne Wijckmans

Martijn Houkes

Martinus Agnes Willem Cuijpers

Danny Maria Hubertus Philips

Wilhelmus Henricus Theodorus Maria Aangenent

Norbertus Josephus Martinus Van Den Nieuwelaar

Ramidin Izair Kamidi

Pieter Mulder

Gerardus Adrianus Antonius Maria Kusters

Robertus Johannes Marinus De Jongh

Martinus Van Duijnhoven

Martin Frans Pierre Smeets

Edwin Augustinus Matheus Van Gompel

Christiaan Louis Valentin

Hrishikesh Patel

Hendrikus Herman Marie Cox

Paul William Scholtes-Van Eijk

Martijn Van Baren

Rob Jansen

Marcus Johannes Van Der Zanden

Menno Fien

Matheus Anna Karel Van Lierop

Mauritius Gerardus Elisabeth Schneiders

Dave Braaksma

Roel Johannes Elisabeth Merry

Michael Frederik Ypma

Ferdinand Bernardus Johannus Wilhelmus Maria Hendriks

René Wilhelmus Antonius Hubertus Leenaars

Stephan Christiaan Quintus Libourel

Leon Leonardus Franciscus Merkx

Maurice Wijckmans

Joost Jozef Hendrik Gielis

Gert-Jan Geradus Johannes Thomas Brands

Nic Jasper Dirkx

Raoul Maarten Simon Knops

The present invention relates to a positioning system, including: a first actuator to exert an actuation force on a moveable body, the first actuator being coupled to a balance mass configured to absorb a reaction force resulting from the actuation force, the actuation force providing an acceleration of the moveable body and the reaction force providing an acceleration of the balance mass, wherein a force resulting from the acceleration of the moveable body together with a force resulting from the acceleration of the balance mass result in a balance mass torque; a balance mass support to support the balance mass onto a frame, which balance mass support engages the frame at a support position; and a torque compensator; wherein the torque compensator exerts a compensation force to compensate the balance mass torque, and wherein the torque compensator exerts the compensation force on the frame at the support position.

Positioning device, lithographic apparatus, method for compensating a balance mass torque and device manufacturing method

An object table to support an object, the object table having a support body, an object holder to hold an object, an opening adjacent an edge of the object holder, and a channel in fluid communication with the opening via a passageway, wherein the channel is defined by a first material which is different to a second material defining the passageway.

Object holder and lithographic apparatus

A liquid confinement system for use in immersion lithography is disclosed in which the meniscus of liquid between the liquid confinement system and the substrate is pinned substantially in place by a meniscus pinning feature. The meniscus pinning feature comprises a plurality of discrete outlets arranged in a polygonal shape.

Lithographic apparatus and device manufacturing method

A projection system (PS) for a lithographic apparatus comprises: an optical path (); a plurality of sensors (S-S); one or more actuators (A-A); and a controller (CN). The optical path is operable to receive an input radiation beam (Bin) and to project an output radiation beam (Bout) onto a substrate to form an image. The optical path comprises: a plurality of optical elements (M-M), the plurality of optical elements comprising: a first set of at least two optical elements (M, M) and a second set of at least one optical element (M, M). Each sensor is associated with one of the plurality of optical elements and is operable to determine a position of that optical element. Each actuator is associated with one of the second set of optical elements and is operable to adjust that optical element. The controller is operable to use the one or more actuators to adjust the second set of optical elements in dependence on the determined position of the first set of optical elements so as to at least partially compensate for optical aberrations and/or line-of-sight errors caused by the positions of the first set of optical elements.

Projection system

A lithographic apparatus having: a substrate table constructed to hold a substrate; a projection system configured to project a patterned radiation beam onto a target portion of the substrate; a substrate surface actuator including a fluid opening for fluid flow therethrough from/onto a facing surface facing the substrate surface actuator to generate a force between the substrate surface actuator and the facing surface, the facing surface being a top surface of the substrate or a surface substantially co-planar with the substrate; and a position controller to control the position and/or orientation of a part of the facing surface by varying fluid flow through the fluid opening to displace the part of the facing surface relative to the projection system.

Lithographic apparatus and a device manufacturing method

An object positioning system including a movable object, an actuator system and a control system. The moveable object is moveable relative to a reference. The actuator system is configured to apply a force to the object at a force application location on the object in order to move the moveable object relative to the reference. The control system is configured to position a point of interest of the object relative to the reference. The control system is configured to drive the actuator system based on a parameter representing a spatial relationship between the force application location and the point of interest. The parameter is dependent on a further parameter representing a position of the object relative to the reference.

Object positioning system, control system, lithographic apparatus, object positioning method and device manufacturing method

A lithographic apparatus is disclosed that is arranged to project a pattern from a patterning device onto a substrate, the lithographic apparatus has a substrate table configured to hold a substrate. The substrate table includes a conditioning system configured to hold a conditioning fluid and to condition the substrate table. The conditioning system includes a pressure damper that is in fluid communication with the conditioning system and is arranged to dampen a pressure variation in the conditioning system.

A position control system to control the position of a movable object, including a position measurement system configured to determine an actual position related quantity of the movable object; a set-point generator to provide a position related set-point signal of the movable object; a comparator to provide an error signal on the basis of a comparison of the actual position related quantity and the position related set-point signal, a controller to provide a control signal on the basis of the error signal, a feed-forward device to provide a feed-forward signal on the basis of the position related set-point signal, and one or more actuators to act on the movable object on the basis of the control signal and the feed-forward signal, wherein the feed-forward device includes a disturbance force correction table including estimations of disturbance forces exerted on the movable object in dependence of a position of the movable object.

Position control system, lithographic apparatus, and method to control a position of a movable object

An immersion lithographic apparatus is disclosed that includes a fluid confinement system configured to confine fluid to a space between a projection system and a substrate. The fluid confinement system includes a fluid inlet to supply fluid, the fluid inlet connected to an inlet port and an outlet port. The immersion lithographic apparatus further includes a fluid supply system configured to control fluid flow through the fluid inlet by varying the flow rate of fluid provided to the inlet port and the flow rate of fluid removed from the outlet port.

A fluid handling structure configured to supply and confine immersion liquid to a space defined between a projection system and a facing surface facing the fluid handling structure is disclosed. The fluid handling structure includes a supply passage formed therein for the passage of fluid from outside the fluid handling structure to the space, and a thermal isolator positioned adjacent the supply passage at least partly to isolate fluid in the supply passage from a thermal load induced in the fluid handling structure.

Fluid handling structure, lithographic apparatus and device manufacturing method

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Beesel, Netherlands

Wilhelmus Franciscus Johannes Simons