Licentia Patent-verwaltungs Gmbh

Wilhelm Senske

Roland Herkert

Ekkehard Niemann

Norbert Marschall

Karl-Heinrich Greeb

Guido Blang

A method of producing an electrophotographic recording material, in which an aluminum substrate is coated with a blocking layer. The blocking layer is coated with a layer of amorphous silicon by direct current magnetron cathode sputtering. At least one sputter target containing silicon is used, and a power density of from about 2.0 W/cm.sup.2 to about 30 W/cm.sup.2 is used for the sputtering. The sputtering is performed in an atmosphere containing hydrogen and an inert gas, with a total pressure of inert gas and hydrogen being in a range from about 1.times.10.sup.-3 to about 10.times.10.sup.-3 mbar. This produces a layer of amorphous silicon having a hydrogen content of more than 40 atom %, an inert gas content in a range of 0.01 to 10 atom %, and in which the relative peak heights of the low and high temperature peaks during hydrogen effusion are approximately equal. The amorphous silicon layer is then coated with a cover layer.

Electrophotographic recording material and method of producing it

The present invention relates to an electrophotographic recording material and to a process for manufacturing it. The material comprises an electrically conductive substrate and a photoconductive layer of amorphous silicon and hydrogen applied thereto. The recording material is characterized by only a single photoconductive layer having an oxygen component of about 1 ppm to 1 atom percent. The recording material is produced by means of cathode sputtering.

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Eschborn, Germany

Wilhelm Senske