Asml Netherlands B.v.

Wilfred Edward Endendijk

Heine Melle Mulder

Patricius Aloysius Jacobus Tinnemans

Paul Van Der Veen

Johannes Jacobus Matheus Baselmans

Markus Franciscus Antonius Eurlings

Adrianus Franciscus Petrus Engelen

Hendrikus Robertus Marie Van Greevenbroek

Jozef Ferdinand Dymphna Verbeeck

Sjoerd Nicolaas Lambertus Donders

Nicolaas Ten Kate

Raymond Wilhelmus Louis Lafarre

Franciscus Johannes Joseph Janssen

Leon Martin Levasier

Adrianus Hendrik Koevoets

Jim Vincent Overkamp

Sander Catharina Reinier Derks

Johannes Adrianus Antonius Theodorus Dams

Marius Ravensbergen

Bert Claessens

Jacobus Cornelis Gerardus Van Der Sanden

Willem Jan Bouman

Bert Pieter Van Drieënhuizen

Erik Johan Arlemark

Hendrikus Robertus Marie Greevenbroek

Marc Hendricus Margaretha Dassen

Thijs Johan Henry Hollink

Johannes Martinus Duisters

Johannes Baselmans

Patricius Tinnemans

Hendrikus Van Greevenbroek

Markus Eurlings

Adrianus Engelen

A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus for cooling the substrate, wherein the cooling apparatus comprises a cooling element located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.

Lithographic apparatus

A device manufacturing method includes conditioning a beam of radiation using an illumination system. The conditioning includes controlling an array of individually controllable elements and associated optical components of the illumination system to convert the radiation beam into a desired illumination mode, the controlling including allocating different individually controllable elements to different parts of the illumination mode in accordance with an allocation scheme, the allocation scheme selected to provide a desired modification of one or more properties of the illumination mode, the radiation beam or both. The method also includes patterning the radiation beam having the desired illumination mode with a pattern in its cross-section to form a patterned beam of radiation, and projecting the patterned radiation beam onto a target portion of a substrate.

Lithographic apparatus and method

An illumination system having an array of individually controllable optical elements is disclosed, wherein each element is moveable between a plurality of orientations which may be selected in order to form desired illumination modes. The illumination system includes a controller to control orientation of one or more of the elements, the controller configured to apply force to the one or more elements which at least partially compensates for force applied to the one or more elements by a burst of radiation incident upon the one or more elements.

Illumination system and lithographic apparatus

A method of controlling an element of an array of individually controllable elements. The method includes varying a frequency of a driving voltage with which the element is driven.

Array element device control method and apparatus

A lithographic optical system is presented herein. The optical system comprises a housing with two optically transparent windows and at least one moveable lens therein, as well as at least one other optical element outside said housing. By providing at least one optical element outside the housing, possible deleterious influences thereof on the optical quality of the moveable lens may be diminished. The housing with the moveable lens may be purged, and may be provided with a linear motor and a gas bearing for contactless moving of the lens.

Lithographic optical system

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Steensel, Netherlands

Wilfred Edward Endendijk