Asml Netherlands B.v.

Wilbert Jan Mestrom

Gerardus Hubertus Petrus Maria Swinkels

Erik Roelof Loopstra

Nicolaas Ten Kate

Hans Jansen

Michel Riepen

Dzmitry Labetski

Hendrikus Gijsbertus Schimmel

Antonius Theodorus Wilhelmus Kempen

Johannes Christiaan Leonardus Franken

Ramin Badie

Henricus Jozef Castelijns

Reinier Theodorus Martinus Jilisen

Albert Pieter Rijpma

Jacob Brinkert

Dennis Jozef Maria Paulussen

Peter Van Putten

Wim Ronald Kampinga

Gerrit Van Der Straaten

Jan Okke Nieuwenkamp

Brian Vernon Virgo

Johannes Hubertus Josephina Moors

Johan Frederik Dijksman

Richard Joseph Bruls

Erik Petrus Buurman

Antonius Kempen

A radiation source comprising a fuel source configured to deliver fuel to a location from which the fuel emits EUV radiation. The radiation source further comprises an immobile fuel debris receiving surface provided with a plurality of grooves. The grooves have orientations which are arranged to direct the flow of liquid fuel under the influence of gravity in one or more desired directions.

Radiation source and lithographic apparatus

A fuel supply for an EUV radiation source is disclosed. The fuel supply comprises a reservoir () for retaining a volume of fuel (), a nozzle (), in fluid connection with the reservoir, and configured to direct a stream of fuel along a trajectory towards a plasma formation location, and a fuel contamination control arrangement () which separates contamination particles from the fuel. The contamination control arrangement comprises at least one acoustic filter. The acoustic filter may apply an acoustic standing wave to the fuel. Also disclosed is a method of controlling contamination in such a fuel supply.

Fuel system for lithographic apparatus, EUV source, lithographic apparatus and fuel filtering method

The present invention provides a method of monitoring the operation of a radiation source fuel droplet stream generator comprising a fuel-containing capillary and a piezo-electric actuator (). The method comprises analyzing the resonance frequency spectrum of a system comprising the fuel-containing capillary and the piezo-electric actuator in particular to look for changes in the resonance frequencies of the acoustic system which may be indicative of a change in the properties of the system requiring investigation.

A radiation source generates extreme ultraviolet radiation for a lithographic apparatus as a chamber that is provided with a low pressure hydrogen environment. A trace amount of a protective compound, e.g., HO, HO, O, NHor NO, is provided to the chamber to assist in maintaining a protective oxide film on metal, e.g., titanium, components in the chamber.

Radiation source, lithographic apparatus and device manufacturing method

A radiation source is disclosed that comprises a reservoir that retains a volume of fuel, a nozzle configured to direct a stream of fuel towards a plasma formation location, a laser configured to generate a radiation generating plasma, and a fuel contamination control arrangement. The contamination control arrangement comprises a magnetic field generation element for generating a magnetic field; an electric field generation element for generating an electric field, the magnetic field generation element and the electric field generation element together configured to ensure that the magnetic field and the electric field overlap at a location of contamination within the fuel, and to ensure that lines of flux of the magnetic field and electric field are non-parallel at that location to control movement of the contamination.

Radiation source

An EUV radiation source includes a fuel supply configured to supply fuel to a plasma formation location. The fuel supply includes a nozzle configured to eject droplets of fuel, and a droplet accelerator configured to accelerate the fuel droplets. The EUV radiation source includes a laser radiation source configured to irradiate the fuel supplied by the fuel supply at the plasma formation location.

EUV radiation source comprising a droplet accelerator and lithographic apparatus

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Roermond, Netherlands

Wilbert Jan Mestrom