Basf Se Corporation

Infineon Technologies Ag

Basf Aktiengesellschaft

Werner Mormann

Klemens Massonne

Michael Siemer

Wei Leng

Karl Siemensmeyer

Michael Sebald

Peter Schuhmacher

Christoph Hohle

Christian Eschbaumer

Christian Kuckertz

Mari Granström

Petra Frank

Jens Ferbitz

Jens Rottstegge

Markus Br&ouml;cher

A process for chlorinating polysaccharides or oligosaccharides, which comprises

Method of chlorinating polysaccharides or oligosaccharides

Process for preparing salts of the formula I(B)xAwhere

Process for preparing ionic liquids by anion exchange

A method of distilling mixtures of salts having a melting point of less than 200&#xb0; C. at 1 bar (ionic liquids). The cation of the ionic liquid has a heterocyclic ring system having at least one nitrogen atom, and all nitrogen atoms of the heterocyclic ring system have an organic group as substituent. The anion of the ionic liquid is a compound having at least one carboxylate group or at least one phosphate group. The distance from the surface via which the heat of distillation is introduced in the distillation (vaporizer surface) to the surface at which condensation takes place (condenser surface) is less than 50 cm at at least one point, with the vaporizer surface and condenser surface themselves having at least one length dimension of greater than 50 cm.

Distillation of ionic liquids

A process for the amplification of structured resists utilizes a reaction between a nucleophilic group and an isocyanate group or thiocyanate group to link an amplification agent to a polymer present in the photoresist. The isocyanate group or the thiocyanate group in addition to the nucleophilic group form a reaction pair. One of the partners is provided on the polymer and the other partner on the amplification agent. The amplification reaction takes place more rapidly than a linkage to carboxylic anhydride groups. Furthermore, the amplification reaction permits the use of polymers that have high transparency at short wavelengths of less than 200 nm, in particular 157 nm.

Process for silylating photoresists in the UV range

Sheet-like structures obtainable by thermal curing and having a crosslinked cholesteric liquid crystalline ordered structure are suitable, for example, for decorative coatings, for producing security marks, pigmentary particles, polarizers, color filters and IR reflectors.

Flat element with a cholesteric liquid crystal structure

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Siegen, Germany

Werner Mormann