Cemecon Ag

Werner Koelker

Oliver Lemmer

Lars Hultman

Stephan Bolz

Christian Bareiss

Grzegorz Greczynski

A process and a device for coating a substrate () are described. In a vacuum chamber (), a first magnetron cathode () is provided with a sputtering target () of a first metal composition comprising predominantly aluminium. A second magnetron cathode () is provided with a sputtering target () of a second metal composition comprising at least 50 at-% of a second metal selected from groups IVA-VIA of the periodic table. In order to obtain coatings with improved properties, electrical power is supplied to the cathodes () such that the targets () are sputtered, where electrical power is supplied to the first cathode () as pulsed electrical power according to high power impulse magnetron sputtering with a first peak current density, and to the second cathode () with a second peak current density lower than the first peak current density. The substrate () is arranged within the vacuum chamber such that particles from the plasma deposit onto the substrate forming a coating.

Coating of substrates using HIPIMS

The invention relates to a body with a substrate (), an intermediate layer () applied on top thereof and a CVD diamond layer () applied to the intermediate layer. In order to propose a body coated with CVD diamond and a production process, in which the body has an increased load-bearing capacity under various mechanical loads, provision is made for the intermediate layer to be predominantly metallic, wherein the metal fraction of the intermediate layer consists predominantly of tungsten and/or chromium, and for the intermediate layer to have a roughness defined by an Rz value of 0.5 &#x3bc;m-3.0 &#x3bc;m.

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Herzogenrath, Germany

Werner Koelker