Rca Inc.

Werner Kern

Chester E Tracy

George L Schnable

Robert D Vibronek

An improved method of depositing borophosphosilicate glass (BPSG) on a substrate is disclosed. The improved method uses temperatures substantially lower than conventional and a volume ratio of oxygen to the total hydride content in the deposition mixture substantially higher than conventional. A BPSG film of increased purity is produced at a rate of deposition substantially faster than conventional procedures.

Deposition of borophosphosilicate glass

A method of accurately terminating the coating of a substrate in an aqueous coating solution is disclosed. The method comprises removing the substrate into an organic displacement liquid which overlies the aqueous coating solution.

Chemical deposition termination

A method and composition for the detection of microdefects in the surface layer of a substrate is disclosed. The composition utilizes dimethylsulfoxide as a primary solvent and a fluorescent organic compound which fluoresces principally in solution. The visibility of microdefects is enhanced by etching the substrate underlying them to form channels for the fluorescent compound.

Structural defect detection

A selective chemical etchant solution for phosphosilicate glass includes a carboxylic acid, hydrogen fluoride and water. The invention is also a method for preferentially etching the phosphosilicate glass which comprises the step of immersing the glasses in the etchant solution of the invention.

Selective etching of phosphosilicate glass

Shaped bulk glass is provided which has improved properties and in particular improved compressive strength. The improvement is obtained by plasma depositing a film of amorphous polymeric hydrogenated silicon-silicon nitride on the surface of the bulk glass.

Bulk glass having improved properties

The addition of 2-ethyl-1-hexanol to an organometallic titanium compound dissolved in a diluent and optionally containing a lower aliphatic alcohol spreading modifier, produces a solution that can be sprayed onto a substrate and cured to form an antireflection titanium oxide coating having a refractive index of from about 2.0 to 2.2.

Sprayable titanium composition

A semiconductor device including a body of semiconductor material with a metallic conductor disposed thereon has a combination glass/low-temperature-(typically 300.degree. C) deposited Si.sub.w N.sub.x H.sub.y O.sub.z passivating overcoat with improved crack and corrosion resistance. This nitride is formed over the conductor, with the glass over the nitride.

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Hightstown, NJ, United States of America

Werner Kern