Samsung Electronics Co., Ltd.

Weonho Park

Yongsik Jeong

Byungsup Shim

Jeonguk Han

Chang Min Jeon

Byoungho Kim

Disclosed is a 2-transistor flash memory that includes a memory cell array, a row driver, a read/write circuit, a charge pump generating a high voltage, and control logic configured to transfer the high voltage to the row driver, the read/write circuit, and the memory cell array. If programming, the row driver and the read/write circuit apply voltages such that a control gate of a cell transistor in an unselected memory cell on a different row from a selected memory cell is floated.

2-transistor flash memory and programming method of 2-transistor flash memory

Nonvolatile memory devices and methods of forming the same are provided, the nonvolatile memory devices may include first regions and second regions which extend in a first direction and are alternately disposed in a semiconductor substrate along a second direction crossing the first direction. Buried doped lines are formed at the first regions respectively and extend in the first direction. The buried doped lines may be doped with a dopant of a first conductivity type. Bulk regions doped with a dopant of a second conductivity type and device isolation patterns are disposed along the second direction. The bulk regions and the device isolation patterns may be formed in the second regions. Word lines crossing the buried doped lines and the bulk regions are formed parallel to one another. Contact structures are connected to the buried doped lines and disposed between the device isolation patterns.

Nonvolatile memory devices and methods of forming the same

Nonvolatile memory devices and methods of forming the same are provided, the nonvolatile memory devices may include first regions and second regions which extend in a first direction and are alternately disposed in a semiconductor substrate along a second direction crossing the first direction. Buried doped lines are formed at the first regions respectively and extend in the first direction. The buried doped lines may be doped with a dopant of a first conductivity type. Bulk regions doped with a dopant of a second conductivity type and device isolation patterns are disposed along the second direction. The bulk regions and the device isolation patterns may be formed in the second regions. Word lines crossing the buried doped lines and the bulk regions are formed parallel to one another. Contact structures are connected to the buried doped lines and disposed between the device isolation patterns. Sidewalls of the device isolation patterns disposed in the first direction overlap with the word lines directly adjacent to the contact structures.

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Hwaseong-si, South Korea

Weonho Park