Hangzhou Mdk Opto Electronics Co., Ltd

Corporation Nw

Zhejiang Mdk Modern Optical Co., Ltd

Hangzhou Meidikai Opto Electronics Co., Ltd.

Wenzhi Ge

Gang Wang

Yiwei Wang

Hirokazu Yajima

Junnan Jiang

Kevin Weng

Ryuji Kimura

Leilei Shan

Wenqin Ge

Ching Sheng Weng

A CVD preparation method for minimizing camera module dot defects includes: performing ultrasonic cleaning and drying on a base substrate to obtain a pre-treated base substrate; placing the pre-treated base substrate into a reaction chamber, evacuating, and introducing nitrogen or inert gas to slightly positive pressure; simultaneously introducing precursor I and precursor II at a temperature of 500-700° C. to deposit a low-refractive-index L layer on the base substrate; halting introduction of the precursor I and the precursor II, and purging the reaction chamber with nitrogen or the inert gas; introducing raw gas precursor III and precursor IV at a temperature of 600-800° C. to deposit a high-refractive-index H layer on the low-refractive-index L layer; and halting introduction of the precursor III and precursor IV, and purging the reaction chamber with nitrogen or inert gas; and cooling to room temperature to obtain an optical element with coating films having different refractive indices.

CVD preparation method for minimizing camera module dot defects and product thereof

An ALD preparation method for eliminating camera module dot defects includes: placing a base substrate in a reaction chamber, and heating to 100-400&#xb0; C.; introducing a first reaction precursor into the reaction chamber to chemically adsorb the first reaction precursor on the base substrate to form a first film layer; removing the excess first reaction precursor, and purging with inert gas; introducing a second reaction precursor into the reaction chamber to create a reaction between the second reaction precursor and the first reaction precursor to form a first refractive index layer; removing the excess second reaction precursor and a by-product of the reaction, and purging with inert gas; introducing a third reaction precursor into the reaction chamber to chemically adsorb the third reaction precursor on a surface of the first refractive index layer to form a second film layer; and removing the excess third reaction precursor, and purging with inert gas.

ALD preparation method for eliminating camera module dot defects and product thereof

An antireflection film is arranged on a surface of a substrate layer. The antireflection film includes a multilayer film arranged on the surface of the substrate layer and a protective film arranged outside the multilayer film. The multilayer film is formed by stacking two or three low-reflection layers. Two protective films are successively arranged outside the multilayer film of the antireflection film. An optical component includes the antireflection film arranged on both sides or one side of an optical filter of the optical component. The high-performance antireflection film can be obtained with respect to a broadband wavelength ranging from 400 nm to 800 nm, and the antireflection film can reduce the occurrence of ghosts or flare when used in an optical system.

Anti-reflection film and an optical component containing the anti-reflection film

The present invention discloses a crystal coating optical low pass filter, which includes a UV-IR cut-off film, a crystal plate, an ink layer, and an AR film. The UV-IR cut-off film can be replaced with an IR film. By coating the crystal plate with ink having infrared absorbing effect to form an ink layer, the present invention possesses both the birefringence characteristic of the crystal and the effect similar to infrared absorbing glass. Compared with the traditional OLPF using infrared absorbing glass, the thickness of the product is reduced and the situation that the infrared absorb glass is fragile and has a poor resistance to drop is significantly improved. The present invention can be used in smartphones, digital cameras, in-vehicle cameras, security cameras and has a large space of marketing.

Crystal coating optical low pass filter and manufacturing method thereof

The present invention discloses a coated narrow-band filter having an absorbent material. Two sides of the substrate are respectively an A-side and a B-side, a cut-off layer is coated or screen printed on the A-side, wherein lights having a wavelength within a first band are allowed to pass through the cut-off layer. The substrate is an absorbent layer, or an absorbent layer is provided on the B-side of the substrate. The absorbent layer is made of an absorbent material, lights having a wavelength within a second band are allowed to pass through the absorbent layer. The first band partially overlaps with the second band. For processing convenience, the coated narrow-band filter having an absorbent material is provided at different angles and with small angle of incidence.

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Hangzhou, China

Wenzhi Ge