Boe Technology Group Co., Ltd.

Chinese Academy of Sciences

Beijing Boe Display Technology Co., Ltd.

Beijing Zstc Environmental Engineering Co., Ltd.

Hbis Group Co., Ltd.

Wenqing Xu

Tingyu Zhu

Huibin Guo

Xiaoxiang Zhang

Mingxuan Liu

Xiaolong Li

Yongzhi Song

Zumou Wu

Yang Yang

Xiaowei Xu

Chunping Long

Lei Shi

Chaoqun Li

Ruizhuang Zhao

Jing Wang

Hongwei Tian

Meng Ye

Yixi Wang

Wen Liu

Hui Tian

Yueping Zuo

Xue Wang

Bin Wan

Kaihong Ma

Jin Xiong

Feng Qi

Jun Xie

Zichao Jiang

Guanjiang Yang

Wanrong Chen

Xindong Wang

A molecular sieve confined noble metal catalyst for CO-SCR denitrification, a preparation method and an application thereof are provided. The catalyst includes a molecular sieve carrier and Ir metal nanoclusters loaded in the molecular sieve carrier through confined encapsulation. The preparation method includes the following steps: mixing a first metal precursor solution with a first ligand to obtain a first mixed solution; mixing a second metal precursor solution with a second ligand to obtain a second mixed solution; mixing a silicon source, an aluminum source, an alkali and a solvent to obtain a molecular sieve precursor solution; mixing the molecular sieve precursor solution with the first mixed solution, then adding the second mixed solution for hydrothermal crystallization reaction, and then centrifugally washing, drying and calcining to obtain the catalyst.

Molecular sieve confined noble metal catalyst for CO-SCR denitrification, preparation method and application thereof

A stepwise gas distribution and graded oxygen supplementation device for distribution of high-ratio circulating flue gas is provided. The circulating flue gas distribution main pipe includes stepped sections communicated with each other in sequence, and pipe diameters of the stepped sections are reduced in sequence along a flue gas moving direction. The circulating flue gas distribution branch pipes are each in communication with and arranged at one side of the corresponding stepped section. The flue gas sealing cover is in communication with gas outlet ends of the circulating flue gas distribution branch pipes. The oxygen supplementing devices are arranged in the circulating flue gas distribution branch pipes needing to increase oxygen content. The oxygen supply device is in communication with gas inlet ends of the oxygen supplementing devices.

Stepwise gas distribution and graded oxygen supplementation device for distribution of high-ratio circulating flue gas

The present application discloses a pellet flue gas circulation and waste heat utilization process and a system thereof, which relates to the technical field of flue gas treatment. The system includes a grate, a rotary kiln, an annular cooler, and ducts connecting each part. On the basis of not changing the existing process a flue gas circulation unit and intelligent control equipment are arranged additionally in the present application. The process is simple, and not only can ensure the parameter stability of the production system such as temperature, gas flow or gas pressure, but also can make full use of the low and medium temperature flue gas components and the waste heat, so as to achieve net zero waste gas discharging, energy saving and emission reduction.

Pellet flue gas circulation and waste heat utilization process and system thereof

Disclosed is separation process of valuable metals from copper anode slime based on oxidation potential modulation, belonging to the technical field of industrial solid waste resource utilization. The differences in redox properties of different metal elements are used to precisely regulate the oxidation potential and acidity of the leaching solution by regulating the amount of oxidizing agent and acid added, so as to selectively and graded leaching and separating the copper (Cu), selenium (Se), tellurium (Te), and silver (Ag) metal elements, and the oxidants used are substances such as HO, Oand O.

Separation process of metals copper anode slime based on oxidation potential modulation

Disclosed is a trolley sealing device for a flue gas circulation system of a sintering machine, including a cover body covering a top surface of a sintering machine trolley. A top end of the cover body is provided with communication assemblies, and the communication assemblies communicate an inner cavity of the cover body with an outside environment; two ends of the inner cavity of the cover body are fixedly connected with vertical adjusting sections respectively, and a sealing device is arranged between the vertical adjusting sections and two ends of the top surface of the sintering machine trolley; and the cover body includes a plurality of frameworks; the plurality of frameworks are arranged above the sintering machine trolley, the communication assemblies are arranged on the frameworks, and skins are fixedly connected with the frameworks; and thermal insulation layers are arranged outside the skins.

Trolley sealing device for flue gas circulation system of sintering machine

Disclosed are a flue gas purification and waste heat utilization system and method. The system comprises a flue gas exhaust unit, a primary waste heat utilization unit, a primary flue gas purification unit, a secondary waste heat utilization unit and a secondary flue gas purification unit that are sequentially connected in a flue gas flow direction, wherein the primary flue gas purification unit is configured for removing NO, large particles and CO in the flue gas, the secondary flue gas purification unit is configured for removing NOand dioxin in the flue gas, an ammonia-spraying device is externally connected between the flue gas exhaust unit and the primary waste heat utilization unit, and the ammonia-spraying device is configured for injecting ammonia gas into the flue gas exhausted from the flue gas exhaust unit.

Flue gas purification and waste heat utilization system and method

A phase shift mask includes a transparent substrate and light-shielding portions. The light-shielding portions include a first light-shielding portion, and over one side of it, a first compensating light-shielding portion, which has a first distance to the first light-shielding portion and a first width smaller than a resolution of an exposing machine utilized for an exposure process using the phase shift mask. The light-shielding portions can further include a second compensating light-shielding portion, having a second distance to another side of the first light-shielding portion and a second width smaller than the resolution of the exposing machine. The first distance and the second distance respectively allow the first and the second compensating light-shielding portion to reduce an exposure at a region corresponding to two sides of the first light-shielding portion during the exposure process. A method manufacturing an electronic component utilizing the phase shift mask is also provided.

Phase shift mask and electronic component manufacturing method

A display panel includes a method of fabricating an array substrate. The method includes forming a metal layer () on a substrate, and patterning the metal layer () using a phase shift mask to form a pattern of metal wiring. The phase shift mask includes a substrate and a wiring light shielding portion () on the substrate (). The wiring light shielding portion () includes a light shielding region () and a phase shift region (). In a direction perpendicular to the extending direction of the wiring light shielding portion () a width of the light shielding region () is larger than a width of the pattern of the metal wiring formed by the wiring light shielding portion ().

Phase shift mask, array substrate, fabrication method thereof and display apparatus

Disclosed are a manufacturing method of a phase shift mask and a phase shift mask. The manufacturing method of a phase shift mask includes: forming a pattern of metal shielding layer on a base substrate; forming a phase shift layer and a first photoresist layer in sequence on the pattern of metal shielding layer; patterning the first photoresist layer with the pattern of metal shielding layer serving as a mask to form a pattern of first photoresist layer; and etching the phase shift layer with the pattern of first photoresist layer serving as a mask to form a pattern of phase shift layer.

Manufacturing method of phase shift mask and phase shift mask

An array substrate includes a base substrate, a plurality of signal lines disposed at a side of the base substrate, and an organic layer disposed at a side of the plurality of signal lines facing away from the base substrate. The organic layer includes at least one auxiliary portion and a reference portion surrounding the at least one auxiliary portion, and a thickness of each auxiliary portion is less than a thickness of the reference portion.

Array substrate and method of manufacturing the same, display device

Disclosed are a mask, a display substrate and a display device. The mask comprises a substrate, a first exposure structure, a second exposure structure located at one side of the substrate and disposed opposite to each other, the first exposure structure comprises a first light transmission film layer and a first light shielding film layer, an orthographic projection of the first light shielding film layer falls within an orthographic projection of the first light transmission film layer on the substrate; the second exposure structure comprises a second light transmission film layer and a second light shielding film layer, an orthographic projection of the second light shielding film layer falls within an orthographic projection of the second light transmission film layer on the substrate; a side edge of the first exposure structure has a first zigzag structure, and a side edge of the second exposure structure has a second zigzag structure.

Mask, display substrate and display device

An array substrate includes a pixel circuit and a light-emitting diode. The pixel circuit includes a driving transistor including a first active medium made of polysilicon, and a switching transistor including a second active medium made of polysilicon. The first active medium has a first grain size. The second active medium has a second grain size larger than the first grain size. The light-emitting diode is coupled to the pixel circuit.

Array substrate, fabrication method thereof, driving transistor and display panel

The present disclosure relates to a metal electrode, an array substrate and a method of producing the same, and a display device. In an embodiment, the method includes: forming a protection layer on a metal layer; patterning the protection layer to form a protection pattern, a profile of the protection pattern being the same as a profile of a predetermined pattern of the metal electrode; and etching a part of the metal layer not covered by the protection pattern to form the metal electrode, the metal electrode being covered by the protection pattern, wherein an etching anisotropy of the protection layer is larger than an etching anisotropy of the metal layer.

Method of producing metal electrode, array substrate and method of producing the same, display device

A flue ozone distributor applied in a low-temperature oxidation denitrification technology and an arrangement manner thereof is disclosed. The flue ozone distributor comprises a distribution main pipe, multiple distribution branch pipes, Venturi distributors and delta wings. The distribution branch pipes are led out from the distribution main pipe as parallel branches. The Venturi distributors are arranged with an equal space on the distribution branch pipes. The delta wings are arranged on one diffusion segment side of the Venturi distributors. The flue ozone distributor is arranged in the flue. The technology is used in the field of denitrification for flue gas of an industrial boiler/kiln by a low-temperature ozone oxidation method. The ozone-injecting direction is consistent with a flow direction of the flue gas. A soot deposit congestion problem does not exist. A turbulent flow behavior of the flue gas and ozone is strengthened. The oxidation efficiency is improved.

Growing community of inventors

Beijing, China

Wenqing Xu