Dow Global Technolgoies LLC

Rohm and Haas Company

Dow Silicones Corporation

Union Carbide Corporation

Rohm and Haas Electronic Materials Cmp Holdings, Inc.

Wenjun Xu

Fanwen Zeng

Liang Chen

Dale C Schmidt

Inna Shulman

Isabelle Van Reeth

Benjamin Yezer

George C Jacob

Emmett Malone Partain, Iii

Jodi M Mecca

Marc-Andre Courtemanche

Bethany Johnson

Dean M Millar

Yuanqiao Rao

Tian Lan

Mohammad T Islam

Nan-Rong Chiou

Helene Dihang

Bhawesh Kumar

Mike Ferritto

Jonathan G Weis

Myoungbae Lee

Sarah E Mastroianni

Jie Xiong

An aqueous suncare formulation is provided, including: a cosmetically acceptable aqueous carrier; a suncare active; and a sulfated crystalline cellulose SPF booster; wherein the sulfated crystalline cellulose SPF booster both boosts the SPF of the aqueous suncare formulation and thickens the aqueous suncare formulation.

Aqueous suncare formulation

A personal care composition is provided, including: a cosmetically acceptable carrier; and a silicon glycan of formula (I): wherein each A comprises an independently selected saccharide moiety; wherein each W is an independently selected beta-amino alcohol moiety; wherein each Y comprises an independently selected organosilicon moiety; wherein each R is independently selected from substituted or unsubstituted hydrocarbyl groups, ether moieties, amine moieties, and H; wherein each Ris independently selected from substituted or unsubstituted hydrocarbyl groups and H; wherein each Z is an independently selected ether moiety; wherein each subscript a is independently 0 or 1; wherein subscripts x and y are each independently from ≥0 to <1; wherein subscript z is selected from >0 to 1; with the proviso that x+y+z=1; and wherein moieties indicated by subscripts x, y, and z may be in randomized or block form in the silicon glycan.

Personal care composition comprising a silicon glycan

An SPF booster is provided, comprising: a multistage polymeric particle having a core comprising polymerized units of a monoethylenically unsaturated carboxylic acid core monomer and a non-ionic ethylenically unsaturated core monomer; an inner shell comprising polymerized units of a non-ionic ethylenically unsaturated inner shell monomer; a monoethylenically unsaturated carboxylic acid inner shell monomer and an aliphatic inner shell monomer; an outer shell comprising polymerized units of a non-ionic ethylenically unsaturated outer shell monomer; an aliphatic outer shell monomer; a monoethylenically unsaturated non-carboxylic acid outer shell monomer and an ethylenically unsaturated surfactant outer shell monomer; wherein the core, when dry, contains a void; and wherein the multistage polymeric particle has an average particle size, when dry, of 50 to 1,000 nm.

SPF booster for use in alcohol base sunscreen formulations

A suncare formulation comprising: a dermatologically acceptable organic carrier; a UV radiation absorbing agent; and an SPF booster; wherein the SPF booster comprises a multistage polymeric particle having a core comprising polymerized units of a monoethylenically unsaturated carboxylic acid core monomer and a non-ionic ethylenically unsaturated core monomer; an inner shell comprising polymerized units of a non-ionic ethylenically unsaturated inner shell monomer; a monoethylenically unsaturated carboxylic acid inner shell monomer and an aliphatic inner shell monomer; an outer shell comprising polymerized units of a non-ionic ethylenically unsaturated outer shell monomer; an aliphatic outer shell monomer; a monoethylenically unsaturated non-carboxylic acid outer shell monomer and an ethylenically unsaturated surfactant outer shell monomer; wherein the core, when dry, contains a void; wherein the multistage polymeric particle has an average particle size, when dry, of 50 to 1,000 nm.

Suncare compositions

A chemical mechanical polishing pad for polishing a semiconductor substrate is provided containing a polishing layer that comprises a polyurethane reaction product of a reaction mixture comprising a curative and a polyisocyanate prepolymer having an unreacted isocyanate (NCO) concentration of from 8.3 to 9.8 wt. % and formed from a polyol blend of polypropylene glycol (PPG) and polytetramethylene ether glycol (PTMEG) and containing a hydrophilic portion of polyethylene glycol or ethylene oxide repeat units, a toluene diisocyanate, and one or more isocyanate extenders, wherein the polyurethane reaction product exhibits a wet Shore D hardness of from 10 to 20% less than the Shore D hardness of the dry polyurethane reaction product.

High planarization efficiency chemical mechanical polishing pads and methods of making

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Phoenixville, PA, United States of America

Wenjun Xu