Boe Technology Group Co., Ltd.

Hefei Boe Optoelectronics Technology Co., Ltd.

Wenjun Shen

Kun Li

Bin Wu

Xuequan Yu

Xiaodong Yu

Zhuyi Luo

Lizhi Ren

Yadong Gao

The invention discloses a clearance adjusting apparatus, a clearance adjusting method and a conveyance device. The clearance adjusting apparatus is used for adjusting a clearance between two opposite rollers and comprises: a driver for driving the roller to move up and down, at least one of the rollers being movable relative to the other; and a controller that stores a predetermined clearance scope being connected with the driver for controlling the driver to drive the movable roller to move up and down, so that the clearance between the two rollers falls into the predetermined clearance scope.

Clearance adjusting apparatus, clearance adjusting method and conveyance device

An alignment exposure method and a method for fabricating a display substrate are disclosed. The alignment exposure method includes a first alignment exposure process and a second alignment exposure process. Multiple groups of alignment marks are provided at an edge of at least one side of the substrate in the first alignment exposure process. At least one group of mark structures are provided at an edge of at least one side of a mask employed in the second alignment exposure process. In multiple mask alignment processes in the second alignment exposure process, each group of the at least one group of the mark structures of the mask are aligned with groups of the alignment marks at a corresponding side of the substrate group by group. The alignment exposure method is employed to realize alignment exposure of a substrate with a size larger than a size of a mask.

Alignment exposure method and method of fabricating display substrate

Growing community of inventors

Beijing, China

Wenjun Shen