Az Electronic Materials USA Corp.

Wenbing Kang

Ralph R Dammel

Hengpeng Wu

Mark O Neisser

Joseph E Oberlander

Xiaowei Wang

Shuji Sue Ding-Lee

Clement Anyadiegwu

Yi Cao

Yuriko Matsuura

SungEun Hong

Aritaka Hishida

Muthiah Thiyagarajan

Medhat E Toukhy

Yu Sui

The present invention provides a pattern formation method capable of preventing formation of surface defects. In the method, a resist surface after subjected to exposure is coated with an acidic film and then subjected to heating treatment. This method is suitably adopted in a process employing liquid immersion lithography and/or light of short wavelength, such as ArF excimer laser beams, for producing a very fine pattern.

Resist pattern formating method

The present invention relates to a positive bottom photoimageable antireflective coating composition which is capable of being developed in an aqueous alkaline developer, wherein the antireflective coating composition comprises a polymer comprising at least one recurring unit with a chromophore group and one recurring unit with a hydroxyl and/or a carboxyl group, a vinyl ether terminated crosslinking agent, and optionally, a photoacid generator and/or an acid and/or a thermal acid generator. The invention further relates to a process for using such a composition.

Positive-working photoimageable bottom antireflective coating

The present invention relates to an aqueous coating composition for coating a photoresist pattern comprising a polymer containing a lactam group of structure (1) where Ris independently selected hydrogen, C-Calkyl, C-Calkyl alcohol, hydroxy (OH), amine (NH), carboxylic acid, and amide (CONH),&#x2009;represents the attachment to the polymer, m=1-6, and n=1-4. The present invention also relates to a process for manufacturing a microelectronic device comprising providing a substrate with a photoresist pattern, coating the photoresist pattern with the novel coating material reacting a portion of the coating material in contact with the photoresist pattern, and removing a portion of the coating material which is not reacted with a removal solution.

Composition for coating over a photoresist pattern comprising a lactam

Growing community of inventors

Kakegawa, Japan

Wenbing Kang