Vanguard International Semiconductor Corporation

Wen-Tsung Wang

Chih-Cherng Liao

Sung-Min Wei

Yi-Tsung Jan

Zhe-Xiong Wu

Yuan-Heng Li

Shao-Chang Huang

Chieh-Yao Chuang

Jung-Tsun Chuang

Chi-Hung Lo

Mao-Tsung Chen

Mao-Tsang Chen

A voltage regulation circuit is suitable to provide an output voltage to a core circuit. The voltage regulation circuit includes a pad, a pull-low unit, a first controlling unit, a second controlling unit and a voltage regulation circuit. The pad receives and provides an input voltage. The pull-low unit generates a pull-low voltage according to the input voltage. The first controlling unit generates a first controlling signal according to the input voltage and the pull-low voltage. The second controlling unit generates a second controlling signal according to the input voltage and the first controlling signal. The voltage regulation unit regulates the input voltage according to the first controlling signal and the second controlling signal, so as to generate the output voltage.

Voltage regulation circuit suitable to provide output voltage to core circuit

A method for fabricating source/drain devices. A semiconductor substrate is provided with a gate formed on the semiconductor substrate, and a hard mask layer formed on the gate. A first doped area is formed on a first side of the gate on the semiconductor substrate, and a second doped area is formed on a second side of the gate on the semiconductor substrate in a manner such that the second doped area is separated from the gate by a predetermined distance. A patterned photo resist layer is formed on the semiconductor substrate having an opening on the second side, the exposed gate equal to half the width of the gate. The semiconductor substrate is implanted and annealed to form a dual diffusion area on the second side of the gate using the patterned photo resist layer and the hard mask layer as masks.

Method for fabricating source/drain devices

A method for fabricating source/drain devices. A semiconductor substrate is provided with a gate formed thereon, a first doped area is formed on a first side of the gate on the semiconductor substrate, and a second doped area is formed on a second side of the gate on the semiconductor substrate in a manner such that the second doped area is separated from the gate by a predetermined distance. A patterned photo resist layer is formed on the semiconductor substrate having an opening on the second side, the exposed gate less than half the width of the gate. The semiconductor substrate is implanted and annealed to form a dual diffusion area on the second side of the gate using the patterned photo resist layer as a mask.

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Taipei, Taiwan

Wen-Tsung Wang