National Applied Research Laboratories

Wen-Hao Cho

Chien-Nan Hsiao

Cheng-Chung Lee

Chi-Chung Kei

Bo-Heng Liu

Da-Ren Liu

Bo-Huei Liao

Donyau Chiang

Po-Kai Chiu

Meng-Yen Tsai

Hung-Ping Chen

Chih-Chieh Yu

Han-Chang Pan

A plasma enhanced atomic layer deposition (PEALD) system used to form thin films on substrates includes a plasma chamber, a processing chamber, two or more ring units and a control piece. The plasma chamber includes an outer and an inner quartz tubular units, whose central axes are aligned with each other. Therefore, plasma is held and concentrated in an annular space formed between the outer and outer quartz tubular units. Due to the first and second through holes, the plasma flow may be more evenly distributed on most of the surface of the substrate to form evenly distributed thin films and nano particles on the substrate. In addition, due to the alignment and misalignment between the first and second through holes, the plasma generated in the plasma chamber may be swiftly allowed or disallowed to enter to the processing chamber to prevent the precursor from forming a CVD.

Plasma enhanced atomic layer deposition system

A head-up display device includes an image module, a substrate, and an optical film. The image module has an emitting source, wherein the emitting source transmits at least one image. The substrate is disposed corresponding to the image module. The optical film is disposed on the substrate and includes at least one transmission layer, wherein each transmission layer has a plurality of transmitting column structures obliquely arranged side by side, and a longitudinal direction of the transmitting column structure has a tilt angle with respect to a normal of the substrate. The at least one image is transmitted to the optical film, and the obliquely disposed transmitting column structures cause the at least one image to scatter on the optical film.

Optical film and head-up display device

An antireflection structure is provided. The antireflection structure includes a substrate layer having a substrate refractive index; a first inorganic layer disposed on the substrate layer and having a first refractive index different from the substrate refractive index, where a thickness of the first inorganic layer is in a range of 1 to 40 nm; and a second inorganic layer disposed on the first inorganic layer and having a second refractive index different from the first refractive index.

Antireflection structure and manufacturing method thereof

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Hsinchu Science Park, Taiwan

Wen-Hao Cho