National Research Council of Canada

Weiman Qian

Wei Qu

Shiqiang Hui

Jian Sun

The invention disclosed is a pulsed power supply for plasma electrolytic deposition (PED) for generating pulsed direct current for controlled interruption of the arcing process of PED, comprising a power distribution and relay logic (PDRL) module; a positive AC/DC (alternating current/direct current) power module; a negative AC/DC power module; a power pulse output module; and a computer control and data acquisition module, wherein the power pulse output module further comprises a pulse controller and an insulated-gate bipolar transistor (IGBT) power switch, and wherein the PDRL module is operatively coupled to both the positive and negative AC/DC power modules and the respective positive and negative power modules are then operatively coupled to both the power pulse output module and the computer control and data acquisition module, and wherein the computer control and data acquisition module controls both the respective positive and negative power modules and the power pulse output module to generate pulsed DC for controlled interruption of the arcing process.

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Vancouver, Canada

Weiman Qian