Taiwan Semiconductor Manufacturing Comp. Ltd.

Weichih Chen

Chung-Hui Chen

Cheng-Hsiang Hsieh

Tsung-Hsin Yu

Chih-Hsien Chang

Ruey-Bin Sheen

Tien-Chien Huang

Wan-Te Chen

Chien-Chun Tsai

Tzu-Ching Chang

A semiconductor structure including first finfet cells and second finfet cells. Each of the first finfet cells has an analog fin boundary according to analog circuit design rules, and each of the second finfet cells has a digital fin boundary according to digital circuit design rules. The semiconductor structure further includes first circuits formed with the first finfet cells, second circuits formed with the second finfet cells, and third circuits formed with one or more of the first finfet cells and one or more of the second finfet cells.

Circuits designed and manufactured with first and second fin boundaries

An integrated circuit (IC) including a plurality of finfet cells designed with digital circuit design rules to provide smaller finfet cells with decreased cell heights, and analog circuit cell structures including first finfet cells of the plurality of finfet cells and including at least one cut metal layer. The smaller finfet cells with decreased cell heights provide a first shorter metal track in one direction and the at least one cut metal layer provides a second shorter metal track in another direction to increase maximum electromigration currents in the integrated circuit.

Circuits designed and manufactured with first and second design rules

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Hsinchu, Taiwan

Weichih Chen