Taiwan Semiconductor Manufacturing Comp. Ltd.

Hong Kong Applied Science and Technology Research Institute Company, Limited

Lingna Holdings Pte., LLC

Seagate Technology Incorporated

Princeton University

Yim Tu Investments Ltd., LLC

Agency for Science, Technology and Research

Johnson Electric S.a.

The Chinese University of Hong Kong

Codexis, Inc.

Johnson Electric International Ag

Bracco Imaging S.p.a.

Shenzhen Sensetime Technology Co., Ltd.

Hong Kong Applied Science and Technology Research

Shenzhen Syscan Technology Co., Limited

Wei Zhang

Yen-Yu Chen

Chang-Sheng Lee

Chung-Liang Cheng

Wei-Jen Chen

Yue Li

Wei-Chen Liao

Xiong Liu

Yong Qing Wang

Chui You Zhou

Chia-Chun Hung

Niraj K Jha

Jian-Shin Tsai

Tzo-Hung Luo

Xiyun Zhang

Derek J Smith

Gang Li

Min Li

Khaled Ben Letaief

Huajun Peng

Karama Hamdi

Chien-Hao Tseng

Min Chen

Chun Kit Hung

Chen-Jung Tsai

Jung-Chen Yang

Ching-Chia Wu

Tsang-Yang Liu

Yu-Hua Chou

Jong-Chen Yang

Shih-Min Liu

Wai Kuen Cham

Xiaoyun Ding

Zhi Ye

Yong Wang

Yi-Chen Chiang

Chi-Chan Tseng

Chian-Liang Lin

Xiaoou Tang

Vesna Mitchell

Xiaogang Wang

Bao Ting Liu

Peter Stanley Gagnon

Ming Ju Chen

Ellen D Eberhard

Jie Chai

Choon Wei Ng

Feng Shen

Ee Lui Ang

Jin Quan Shen

Chia-Hsi Wang

Harry Tiotantra

Sheng-Wei Yeh

Yong Bin Li

Utt Heng Kan

Yingfeng Lv

Li Shang

AikChuan Lim

Kin Lung Chan

Fu Ping Zhang

Zhiguo Chang

Jing Tian

Zhao Wang

Chunhua Sun

Chengwu Gu

Ping Hung Tang

Xiao Lin Zhang

Shih-Wei Bih

Guoping Qiu

ChoonWei Ng

Jian Shin Tsai

Kam Ho Poon

Yu Hua Chou

Tzo Hung Luo

Chi Chan Tseng

Jong Chen Yang

Chun Bong Leung

Yan Ling Phyllicia Toh

Hsien-Chieh Hsiao

Ting-Jung Lin

Chun-Kit Hung

Yong Li

A battery of a preselected type advantageously has a beveled edge formed between a front-end surface and a lateral surface of the battery. In a battery charger, a slot has a cap formed with an interior channel for receiving a front-end portion of the preselected-type battery. The cap has a stopping member for stopping the preselected-type battery so as to receive recharging. Advantageously, the stopping member may be shaped to complement the beveled edge for seamlessly receiving the beveled edge when the preselected-type battery is inserted into the slot. A mismatch between the stopping member and a line edge of an unaccepted-type battery causes the stopping member to block the unaccepted-type battery from reaching deeper into the channel than the preselected-type battery when the unaccepted-type battery is inserted, disconnecting a positive charging terminal from the unaccepted-type battery to avoid the charger from accidentally recharging the unaccepted-type battery.

Mechanical foolproof design of battery charger and rechargeable battery

The technology disclosed herein pertains to a system and method for storing data on a storage media using both down-track super parity and cross-track super parity. Specifically, a method disclosed herein provides for generating down-track super parity values for data on the plurality of tracks and storing the down-track super parity values on a down-track super parity row of the storage block and generating cross-track super parity values for data on the plurality of rows and storing the cross-track super parity values on a cross-track upper parity track, wherein the cross-track super parity value for any given row is generated by inputting the data on the given row into an exclusive-OR (XOR) gate.

Matrix super parity for data storage

A chemical-mechanical planarization (CMP) system includes a platen, a pad, a polish head, a rotating mechanism, a light source, and a detector. The pad is disposed on the platen. The polish head is configured to hold a wafer against the pad. The rotating mechanism is configured to rotate at least one of the platen and the polish head. The light source is configured to provide incident light to an end-point layer on the wafer. The detector is configured to detect absorption of the incident light by the end-point layer.

Planarization method, method for polishing wafer, and CMP system

This application describes compositions, kits, and methods for removing contaminants from a protein preparation, for example a cell culture harvest comprising a recombinant protein. The methods described herein can enhance the performance of a later applied chromatographic purification step. The method generally involves contacting a protein preparation comprising a desired protein with a combination of allantoin, a cationic polymer, and a fatty acid, thereby causing the formation of solids and removal of the solids using a suitable process. Further treatment by contacting the treated sample with a chemically reactive surface further enhances results achieved by the first purification step.

Method of enhancing the performance of chromatography methods for purification of proteins

A method includes storing a superset of data on a data storage medium along with a corresponding superset superparity. The superset of data includes multiple sets of data, and the corresponding superset superparity is calculated based on all of the multiple sets of data. The method also includes updating at least one subset of the superset of data. The subset has a subset superparity. The superset superparity is updated with the subset superparity, and the subset superparity and a location of the subset within the superset are employed to carry out error correction operations.

Managing superparity storage location usage and coverage

A apparatus includes a susceptor and a non-reactive gas source. The susceptor has through holes and a wafer support surface. Each through hole includes a lift pin and a lift pin head. The lift pin has a vertical degree of motion in the through hole to lift up or place a wafer on the susceptor. The lift pin head has at least one flow channel structure running from its first surface at least partially exposed to a bottom side of the susceptor through its second surface exposed to a top side of the susceptor wherein the lift pin. The non-reactive gas source is configured to flow a gas to a backside of the wafer through the flow channel structure through the bottom side of the susceptor.

Apparatus and system for preventing backside peeling defects on semiconductor wafers

A method includes writing first data to a first track of a magnetic recording medium of a storage device. First parity sectors corresponding to the first data are written. The first parity sectors have a first size. Second parity sectors corresponding to the first data are written. The second parity sectors have a second size. Second data is written to a second track of the magnetic recording medium. The second track is adjacent to the first track. It is determined whether an unrecoverable data error has occurred on the second track. After writing to the second track and determining that no unrecoverable data error has occurred, the first and second parity sectors corresponding to the first data are released.

Mode hop mitigation solutions in a heat-assisted magnetic recording head

A system for detecting a gazing point of a user in a three-dimensional (3D) space based on a virtual screen is provided. The system includes at least a processor and a wearable device, the wearable device further comprising an external camera arranged for capturing images of the user's field of view, and two internal cameras arranged for capturing binocular images of the user's left and right eyes. The processor is designed to determine the gazing point of the user based on a virtual screen. The coordinates of the pupil center as determined according to the images from the internal cameras are mapped to the images from the external camera based on a left and a right mapping relationships, which further mapped to the virtual screen as an intermediate screen for calculating the 3D coordinates of the gazing point.

3D gazing point detection by binocular homography mapping

A motor, a pump and a cleaning apparatus are provided. The motor includes a stator and a rotor rotatable relative to the stator. The stator includes a stator core and stator windings wound around the stator core. The stator core includes a pair of opposing poles and a yoke connected between the poles. Each pole has a pole arc surface facing the rotor, with an air gap formed between the pole arc surface and the rotor. The pair of poles includes opposing circumferential end portions spaced apart from each other, and a ratio of a distance between the circumferential end portions to a minimum width of the air gap between the pole arc surface and the rotor is less than 2.

Motor, pump and cleaning apparatus

Chemical-mechanical planarization system

The present disclosure provides a method for controlling a semiconductor deposition operation. The method includes (i) identifying a first target lifetime in a physical vapor deposition (PVD) system; (ii) inputting the first target lifetime into a processor; (iii) outputting, by the processor, a plurality of first operation parameters according to a plurality of compensation curves; and (iv) performing the first operation parameters in the PVD system. The first operation parameters includes, but not limited to, an RF power tuning, a DC voltage tuning, a target to chamber pedestal spacing tuning, an AC bias tuning, an impedance tuning, a reactive gas flow tuning, an inert gas flow tuning, a chamber pedestal temperature tuning, or a combination thereof.

Method for controlling semiconductor deposition operation

A single phase brushless motor includes a stator and a rotor. The stator includes a stator core and stator windings wound on the stator core. The stator core includes a yoke portion, and first and second pole portions extending inwardly from the yoke portion. An end surface of the first pole portion includes a first arc surface having a first groove. An end surface of the second pole portion includes a second arc surface having a second groove. The first and second arc surfaces are opposed to each other and define a receiving space therebetween. The rotor includes a rotary shaft and permanent magnetic poles fixed to the rotary shaft. The permanent magnetic poles are received in the receiving space. A substantially uniform gap is formed between the first arc surface and the second arc surface and the permanent magnetic poles.

Single phase brushless motor

A wearable device, having a camera and a light source, receives user inputs by a first method of measuring a height of a finger-like object's tip above a reference surface if this surface is present, or a second method of estimating a 3D location of the tip. In the first method, a plain sheet of light is projected to the object, casting a shadow on the surface. A camera-observed shadow length is used to compute the tip's height above the surface. In the second method, the nearest and farthest locations of the tip are estimated according to pre-determined lower and upper bounds of the object's physical width. The object is then illuminated with a structured-light pattern configured such that an area between the nearest and farthest locations receives a portion of the pattern where this portion does not contain a repeated sub-pattern, enabling unique determination of the tip's 3D location.

Wearable device with intelligent user-input interface

A physical vapor deposition (PVD) chamber, a process kit of a PVD chamber and a method of fabricating a process kit of a PVD chamber are provided. In various embodiments, the PVD chamber includes a sputtering target, a power supply, a process kit, and a substrate support. The sputtering target has a sputtering surface that is in contact with a process region. The power supply is electrically connected to the sputtering target. The process kit has an inner surface at least partially enclosing the process region, and a liner layer disposed on the inner surface. The substrate support has a substrate receiving surface, wherein the liner layer disposed on the inner surface of the process kit has a surface roughness (Rz), and the surface roughness (Rz) is substantially in a range of 50-200 &#x3bc;m.

Process kit of physical vapor deposition chamber and fabricating method thereof

Growing community of inventors

Hong Kong, China

Wei Zhang